A three-layer and two-stage platform for positioning with nanometer resolution and submicrometer accuracy

Marta Torralba, José A. Yagüe-Fabra, José A. Albajez, Margarita Valenzuela, Raquel Acero, Juan J. Aguilar

Research output: Contribution to conferencePaper

Original languageAmerican English
Pages132-135
Number of pages4
StatePublished - 1 Jan 2014
Externally publishedYes
Event11th IMEKO TC14 Symposium on Laser Metrology for Precision Measurement and Inspection in Industry, LMPMI 2014 -
Duration: 1 Jan 2014 → …

Conference

Conference11th IMEKO TC14 Symposium on Laser Metrology for Precision Measurement and Inspection in Industry, LMPMI 2014
Period1/01/14 → …

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Precision engineering
Surface topography
Nanotechnology
Atomic force microscopy
Finite element method

Cite this

Torralba, M., Yagüe-Fabra, J. A., Albajez, J. A., Valenzuela, M., Acero, R., & Aguilar, J. J. (2014). A three-layer and two-stage platform for positioning with nanometer resolution and submicrometer accuracy. 132-135. Paper presented at 11th IMEKO TC14 Symposium on Laser Metrology for Precision Measurement and Inspection in Industry, LMPMI 2014, .
Torralba, Marta ; Yagüe-Fabra, José A. ; Albajez, José A. ; Valenzuela, Margarita ; Acero, Raquel ; Aguilar, Juan J. / A three-layer and two-stage platform for positioning with nanometer resolution and submicrometer accuracy. Paper presented at 11th IMEKO TC14 Symposium on Laser Metrology for Precision Measurement and Inspection in Industry, LMPMI 2014, .4 p.
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title = "A three-layer and two-stage platform for positioning with nanometer resolution and submicrometer accuracy",
author = "Marta Torralba and Yag{\"u}e-Fabra, {Jos{\'e} A.} and Albajez, {Jos{\'e} A.} and Margarita Valenzuela and Raquel Acero and Aguilar, {Juan J.}",
year = "2014",
month = "1",
day = "1",
language = "American English",
pages = "132--135",
note = "11th IMEKO TC14 Symposium on Laser Metrology for Precision Measurement and Inspection in Industry, LMPMI 2014 ; Conference date: 01-01-2014",

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Torralba, M, Yagüe-Fabra, JA, Albajez, JA, Valenzuela, M, Acero, R & Aguilar, JJ 2014, 'A three-layer and two-stage platform for positioning with nanometer resolution and submicrometer accuracy', Paper presented at 11th IMEKO TC14 Symposium on Laser Metrology for Precision Measurement and Inspection in Industry, LMPMI 2014, 1/01/14 pp. 132-135.

A three-layer and two-stage platform for positioning with nanometer resolution and submicrometer accuracy. / Torralba, Marta; Yagüe-Fabra, José A.; Albajez, José A.; Valenzuela, Margarita; Acero, Raquel; Aguilar, Juan J.

2014. 132-135 Paper presented at 11th IMEKO TC14 Symposium on Laser Metrology for Precision Measurement and Inspection in Industry, LMPMI 2014, .

Research output: Contribution to conferencePaper

TY - CONF

T1 - A three-layer and two-stage platform for positioning with nanometer resolution and submicrometer accuracy

AU - Torralba, Marta

AU - Yagüe-Fabra, José A.

AU - Albajez, José A.

AU - Valenzuela, Margarita

AU - Acero, Raquel

AU - Aguilar, Juan J.

PY - 2014/1/1

Y1 - 2014/1/1

M3 - Paper

SP - 132

EP - 135

ER -

Torralba M, Yagüe-Fabra JA, Albajez JA, Valenzuela M, Acero R, Aguilar JJ. A three-layer and two-stage platform for positioning with nanometer resolution and submicrometer accuracy. 2014. Paper presented at 11th IMEKO TC14 Symposium on Laser Metrology for Precision Measurement and Inspection in Industry, LMPMI 2014, .