TY - JOUR
T1 - Adaptable Ultraviolet Reflecting Polymeric Multilayer Coatings of High Refractive Index Contrast
AU - Smirnov, José Raúl Castro
AU - Ito, Masateru
AU - Calvo, Mauricio Ernesto
AU - López-López, Carmen
AU - Jiménez-Solano, Alberto
AU - Galisteo-López, Juan Francisco
AU - Zavala-Rivera, Paul
AU - Tanaka, Koichiro
AU - Sivaniah, Easan
AU - Míguez, Hernán
N1 - Publisher Copyright:
© 2015 The Authors.
PY - 2015/11/1
Y1 - 2015/11/1
N2 - A synthetic route is demonstrated to build purely polymeric nanostructured multilayer coatings, adaptable to arbitrary surfaces, and capable of efficiently blocking by reflection a targeted and tunable ultraviolet (UV) range. Reflection properties are determined by optical interference between UV light beams reflected at the interfaces between polystyrene layers of different porosity and hence refractive index. As no dopant absorber intervenes in the shielding effect, polymer degradation effects are prevented. Alternated porosity results from the modulation of photochemical effects at the few tens of nanometers length scale, combined with the collective osmotic shock induced during the processing of the precursor diblock copolymer film. Experimental evidence of the application of this method to coat rough surfaces with smooth and conformal UV protecting films is provided.
AB - A synthetic route is demonstrated to build purely polymeric nanostructured multilayer coatings, adaptable to arbitrary surfaces, and capable of efficiently blocking by reflection a targeted and tunable ultraviolet (UV) range. Reflection properties are determined by optical interference between UV light beams reflected at the interfaces between polystyrene layers of different porosity and hence refractive index. As no dopant absorber intervenes in the shielding effect, polymer degradation effects are prevented. Alternated porosity results from the modulation of photochemical effects at the few tens of nanometers length scale, combined with the collective osmotic shock induced during the processing of the precursor diblock copolymer film. Experimental evidence of the application of this method to coat rough surfaces with smooth and conformal UV protecting films is provided.
KW - Block copolymers
KW - Collective osmotic shock
KW - Photonic crystals
KW - Porous multilayers
KW - UV lithography
UR - http://www.scopus.com/inward/record.url?scp=84954374363&partnerID=8YFLogxK
U2 - 10.1002/adom.201500209
DO - 10.1002/adom.201500209
M3 - Artículo
SN - 2195-1071
VL - 3
SP - 1633
EP - 1639
JO - Advanced Optical Materials
JF - Advanced Optical Materials
IS - 11
ER -