| Original language | American English |
|---|---|
| Pages (from-to) | 517-520 |
| Number of pages | 4 |
| Journal | Thin Solid Films |
| DOIs | |
| State | Published - 29 Oct 2010 |
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Thin film transistors
Threshold voltage
Ammonia
ammonia
transistors
threshold voltage
thin films
Gases
Sodium
Annealing
citrates
Ions
Thin films
baths
sodium
annealing
electric potential
gases
ions
sodium citrate
Cite this
Arreola-Jardón, G., González, L. A., García-Cerda, L. A., Gnade, B., Quevedo-López, M. A., & Ramírez-Bon, R. (2010). Ammonia-free chemically deposited CdS films as active layers in thin film transistors. Thin Solid Films, 517-520. https://doi.org/10.1016/j.tsf.2010.08.097
@article{3c7c94eeb8c649a5824839bad5cd114b,
title = "Ammonia-free chemically deposited CdS films as active layers in thin film transistors",
author = "G. Arreola-Jard{\'o}n and Gonz{\'a}lez, {L. A.} and Garc{\'i}a-Cerda, {L. A.} and B. Gnade and Quevedo-L{\'o}pez, {M. A.} and R. Ram{\'i}rez-Bon",
year = "2010",
month = "10",
day = "29",
doi = "10.1016/j.tsf.2010.08.097",
language = "American English",
pages = "517--520",
journal = "Thin Solid Films",
issn = "0040-6090",
publisher = "Elsevier",
}
Arreola-Jardón, G, González, LA, García-Cerda, LA, Gnade, B, Quevedo-López, MA & Ramírez-Bon, R 2010, 'Ammonia-free chemically deposited CdS films as active layers in thin film transistors', Thin Solid Films, pp. 517-520. https://doi.org/10.1016/j.tsf.2010.08.097
Ammonia-free chemically deposited CdS films as active layers in thin film transistors. / Arreola-Jardón, G.; González, L. A.; García-Cerda, L. A.; Gnade, B.; Quevedo-López, M. A.; Ramírez-Bon, R.
In: Thin Solid Films, 29.10.2010, p. 517-520.Research output: Contribution to journal › Article › Research › peer-review
TY - JOUR
T1 - Ammonia-free chemically deposited CdS films as active layers in thin film transistors
AU - Arreola-Jardón, G.
AU - González, L. A.
AU - García-Cerda, L. A.
AU - Gnade, B.
AU - Quevedo-López, M. A.
AU - Ramírez-Bon, R.
PY - 2010/10/29
Y1 - 2010/10/29
U2 - 10.1016/j.tsf.2010.08.097
DO - 10.1016/j.tsf.2010.08.097
M3 - Article
SP - 517
EP - 520
JO - Thin Solid Films
JF - Thin Solid Films
SN - 0040-6090
ER -
Arreola-Jardón G, González LA, García-Cerda LA, Gnade B, Quevedo-López MA, Ramírez-Bon R. Ammonia-free chemically deposited CdS films as active layers in thin film transistors. Thin Solid Films. 2010 Oct 29;517-520. https://doi.org/10.1016/j.tsf.2010.08.097