| Original language | English |
|---|---|
| Pages (from-to) | 281-295 |
| Number of pages | 15 |
| Journal | Applied Surface Science |
| Volume | 481 |
| DOIs | |
| State | Published - 1 Jul 2019 |
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Keywords
- Active background approach
- Chemical bath deposition
- Copper sulfide
- Peak-fitting
- Quantitative XPS
- X-ray photoelectron spectroscopy
Cite this
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Assessing the chemical state of chemically deposited copper sulfide : A quantitative analysis of the X-ray photoelectron spectra of the amorphous-to-covellite transition phases. / Cabrera-German, D.; García-Valenzuela, J. A.; Martínez-Gil, M.; Suárez-Campos, G.; Montiel-González, Z.; Sotelo-Lerma, M.; Cota-Leal, M.
In: Applied Surface Science, Vol. 481, 01.07.2019, p. 281-295.Research output: Contribution to journal › Article › Research › peer-review
TY - JOUR
T1 - Assessing the chemical state of chemically deposited copper sulfide
T2 - A quantitative analysis of the X-ray photoelectron spectra of the amorphous-to-covellite transition phases
AU - Cabrera-German, D.
AU - García-Valenzuela, J. A.
AU - Martínez-Gil, M.
AU - Suárez-Campos, G.
AU - Montiel-González, Z.
AU - Sotelo-Lerma, M.
AU - Cota-Leal, M.
PY - 2019/7/1
Y1 - 2019/7/1
KW - Active background approach
KW - Chemical bath deposition
KW - Copper sulfide
KW - Peak-fitting
KW - Quantitative XPS
KW - X-ray photoelectron spectroscopy
UR - http://www.scopus.com/inward/record.url?scp=85062962761&partnerID=8YFLogxK
U2 - 10.1016/j.apsusc.2019.03.054
DO - 10.1016/j.apsusc.2019.03.054
M3 - Artículo
VL - 481
SP - 281
EP - 295
JO - Applied Surface Science
JF - Applied Surface Science
SN - 0169-4332
ER -