Assessing the chemical state of chemically deposited copper sulfide: A quantitative analysis of the X-ray photoelectron spectra of the amorphous-to-covellite transition phases

D. Cabrera-German, J. A. García-Valenzuela, M. Martínez-Gil, G. Suárez-Campos, Z. Montiel-González, M. Sotelo-Lerma, M. Cota-Leal

Research output: Contribution to journalArticleResearchpeer-review

Original languageEnglish
Pages (from-to)281-295
Number of pages15
JournalApplied Surface Science
Volume481
DOIs
StatePublished - 1 Jul 2019

Fingerprint

copper sulfides
Sulfides
Electron transitions
Photoelectrons
quantitative analysis
Copper
chemical composition
photoelectrons
X rays
Chemical analysis
x rays
photoelectric emission
Photoemission
pyrites
nitrogen
atmospheres
Pyrites
annealing
oxides
cupric sulfide

Keywords

  • Active background approach
  • Chemical bath deposition
  • Copper sulfide
  • Peak-fitting
  • Quantitative XPS
  • X-ray photoelectron spectroscopy

Cite this

Cabrera-German, D. ; García-Valenzuela, J. A. ; Martínez-Gil, M. ; Suárez-Campos, G. ; Montiel-González, Z. ; Sotelo-Lerma, M. ; Cota-Leal, M. / Assessing the chemical state of chemically deposited copper sulfide : A quantitative analysis of the X-ray photoelectron spectra of the amorphous-to-covellite transition phases. In: Applied Surface Science. 2019 ; Vol. 481. pp. 281-295.
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Assessing the chemical state of chemically deposited copper sulfide : A quantitative analysis of the X-ray photoelectron spectra of the amorphous-to-covellite transition phases. / Cabrera-German, D.; García-Valenzuela, J. A.; Martínez-Gil, M.; Suárez-Campos, G.; Montiel-González, Z.; Sotelo-Lerma, M.; Cota-Leal, M.

In: Applied Surface Science, Vol. 481, 01.07.2019, p. 281-295.

Research output: Contribution to journalArticleResearchpeer-review

TY - JOUR

T1 - Assessing the chemical state of chemically deposited copper sulfide

T2 - A quantitative analysis of the X-ray photoelectron spectra of the amorphous-to-covellite transition phases

AU - Cabrera-German, D.

AU - García-Valenzuela, J. A.

AU - Martínez-Gil, M.

AU - Suárez-Campos, G.

AU - Montiel-González, Z.

AU - Sotelo-Lerma, M.

AU - Cota-Leal, M.

PY - 2019/7/1

Y1 - 2019/7/1

KW - Active background approach

KW - Chemical bath deposition

KW - Copper sulfide

KW - Peak-fitting

KW - Quantitative XPS

KW - X-ray photoelectron spectroscopy

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DO - 10.1016/j.apsusc.2019.03.054

M3 - Artículo

VL - 481

SP - 281

EP - 295

JO - Applied Surface Science

JF - Applied Surface Science

SN - 0169-4332

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