Assessing the chemical state of chemically deposited copper sulfide: A quantitative analysis of the X-ray photoelectron spectra of the amorphous-to-covellite transition phases

D. Cabrera-German; J. A. García-Valenzuela; M. Martínez-Gil; G. Suárez-Campos; Z. Montiel-González; M. Sotelo-Lerma; M. Cota-Leal

doi:10.1016/j.apsusc.2019.03.054

Assessing the chemical state of chemically deposited copper sulfide: A quantitative analysis of the X-ray photoelectron spectra of the amorphous-to-covellite transition phases

D. Cabrera-German, J. A. García-Valenzuela, M. Martínez-Gil, G. Suárez-Campos, Z. Montiel-González, M. Sotelo-Lerma, M. Cota-Leal^*

^*Corresponding author for this work

Universidad de Sonora

Research output: Contribution to journal › Article › peer-review

6 Scopus citations

Original language	English
Pages (from-to)	281-295
Number of pages	15
Journal	Applied Surface Science
Volume	481
DOIs	https://doi.org/10.1016/j.apsusc.2019.03.054
State	Published - 1 Jul 2019

Keywords

Active background approach
Chemical bath deposition
Copper sulfide
Peak-fitting
Quantitative XPS
X-ray photoelectron spectroscopy

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10.1016/j.apsusc.2019.03.054

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Cabrera-German, D., García-Valenzuela, J. A., Martínez-Gil, M., Suárez-Campos, G., Montiel-González, Z., Sotelo-Lerma, M., & Cota-Leal, M. (2019). Assessing the chemical state of chemically deposited copper sulfide: A quantitative analysis of the X-ray photoelectron spectra of the amorphous-to-covellite transition phases. Applied Surface Science, 481, 281-295. https://doi.org/10.1016/j.apsusc.2019.03.054

Cabrera-German, D. ; García-Valenzuela, J. A. ; Martínez-Gil, M. ; Suárez-Campos, G. ; Montiel-González, Z. ; Sotelo-Lerma, M. ; Cota-Leal, M. / Assessing the chemical state of chemically deposited copper sulfide : A quantitative analysis of the X-ray photoelectron spectra of the amorphous-to-covellite transition phases. In: Applied Surface Science. 2019 ; Vol. 481. pp. 281-295.

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keywords = "Active background approach, Chemical bath deposition, Copper sulfide, Peak-fitting, Quantitative XPS, X-ray photoelectron spectroscopy",

author = "D. Cabrera-German and Garc{\'i}a-Valenzuela, {J. A.} and M. Mart{\'i}nez-Gil and G. Su{\'a}rez-Campos and Z. Montiel-Gonz{\'a}lez and M. Sotelo-Lerma and M. Cota-Leal",

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Cabrera-German, D, García-Valenzuela, JA, Martínez-Gil, M, Suárez-Campos, G, Montiel-González, Z, Sotelo-Lerma, M & Cota-Leal, M 2019, 'Assessing the chemical state of chemically deposited copper sulfide: A quantitative analysis of the X-ray photoelectron spectra of the amorphous-to-covellite transition phases', Applied Surface Science, vol. 481, pp. 281-295. https://doi.org/10.1016/j.apsusc.2019.03.054

Assessing the chemical state of chemically deposited copper sulfide : A quantitative analysis of the X-ray photoelectron spectra of the amorphous-to-covellite transition phases. / Cabrera-German, D.; García-Valenzuela, J. A.; Martínez-Gil, M.; Suárez-Campos, G.; Montiel-González, Z.; Sotelo-Lerma, M.; Cota-Leal, M.

In: Applied Surface Science, Vol. 481, 01.07.2019, p. 281-295.

Research output: Contribution to journal › Article › peer-review

TY - JOUR

T1 - Assessing the chemical state of chemically deposited copper sulfide

T2 - A quantitative analysis of the X-ray photoelectron spectra of the amorphous-to-covellite transition phases

AU - Cabrera-German, D.

AU - García-Valenzuela, J. A.

AU - Martínez-Gil, M.

AU - Suárez-Campos, G.

AU - Montiel-González, Z.

AU - Sotelo-Lerma, M.

AU - Cota-Leal, M.

PY - 2019/7/1

Y1 - 2019/7/1

KW - Active background approach

KW - Chemical bath deposition

KW - Copper sulfide

KW - Peak-fitting

KW - Quantitative XPS

KW - X-ray photoelectron spectroscopy

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DO - 10.1016/j.apsusc.2019.03.054

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JF - Applied Surface Science

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Cabrera-German D, García-Valenzuela JA, Martínez-Gil M, Suárez-Campos G, Montiel-González Z, Sotelo-Lerma M et al. Assessing the chemical state of chemically deposited copper sulfide: A quantitative analysis of the X-ray photoelectron spectra of the amorphous-to-covellite transition phases. Applied Surface Science. 2019 Jul 1;481:281-295. https://doi.org/10.1016/j.apsusc.2019.03.054