Assessing the chemical state of chemically deposited copper sulfide: A quantitative analysis of the X-ray photoelectron spectra of the amorphous-to-covellite transition phases

D. Cabrera-German, J. A. García-Valenzuela, M. Martínez-Gil, G. Suárez-Campos, Z. Montiel-González, M. Sotelo-Lerma, M. Cota-Leal*

*Corresponding author for this work

Research output: Contribution to journalArticle

5 Scopus citations
Original languageEnglish
Pages (from-to)281-295
Number of pages15
JournalApplied Surface Science
Volume481
DOIs
StatePublished - 1 Jul 2019

Keywords

  • Active background approach
  • Chemical bath deposition
  • Copper sulfide
  • Peak-fitting
  • Quantitative XPS
  • X-ray photoelectron spectroscopy

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