Boron penetration studies from p<sup>+</sup>polycrystalline Si through HfSi<inf>x</inf>O<inf>y</inf>

M. A. Quevedo-Lopez, M. El-Bouanani, M. J. Kim, B. E. Gnade, R. M. Wallace, M. R. Visokay, A. Lifatou, M. J. Bevan, L. Colombo

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47 Citations (Scopus)
Original languageAmerican English
Pages (from-to)1074-1076
Number of pages3
JournalApplied Physics Letters
DOIs
StatePublished - 5 Aug 2002
Externally publishedYes

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diffusivity
boron
penetration
annealing
grain boundaries
physics
profiles

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Quevedo-Lopez, M. A., El-Bouanani, M., Kim, M. J., Gnade, B. E., Wallace, R. M., Visokay, M. R., ... Colombo, L. (2002). Boron penetration studies from p<sup>+</sup>polycrystalline Si through HfSi<inf>x</inf>O<inf>y</inf> Applied Physics Letters, 1074-1076. https://doi.org/10.1063/1.1498872
Quevedo-Lopez, M. A. ; El-Bouanani, M. ; Kim, M. J. ; Gnade, B. E. ; Wallace, R. M. ; Visokay, M. R. ; Lifatou, A. ; Bevan, M. J. ; Colombo, L. / Boron penetration studies from p<sup>+</sup>polycrystalline Si through HfSi<inf>x</inf>O<inf>y</inf>. In: Applied Physics Letters. 2002 ; pp. 1074-1076.
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title = "Boron penetration studies from p+polycrystalline Si through HfSixOy",
author = "Quevedo-Lopez, {M. A.} and M. El-Bouanani and Kim, {M. J.} and Gnade, {B. E.} and Wallace, {R. M.} and Visokay, {M. R.} and A. Lifatou and Bevan, {M. J.} and L. Colombo",
year = "2002",
month = "8",
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doi = "10.1063/1.1498872",
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Quevedo-Lopez, MA, El-Bouanani, M, Kim, MJ, Gnade, BE, Wallace, RM, Visokay, MR, Lifatou, A, Bevan, MJ & Colombo, L 2002, 'Boron penetration studies from p<sup>+</sup>polycrystalline Si through HfSi<inf>x</inf>O<inf>y</inf>', Applied Physics Letters, pp. 1074-1076. https://doi.org/10.1063/1.1498872

Boron penetration studies from p<sup>+</sup>polycrystalline Si through HfSi<inf>x</inf>O<inf>y</inf> / Quevedo-Lopez, M. A.; El-Bouanani, M.; Kim, M. J.; Gnade, B. E.; Wallace, R. M.; Visokay, M. R.; Lifatou, A.; Bevan, M. J.; Colombo, L.

In: Applied Physics Letters, 05.08.2002, p. 1074-1076.

Research output: Contribution to journalArticleResearchpeer-review

TY - JOUR

T1 - Boron penetration studies from p+polycrystalline Si through HfSixOy

AU - Quevedo-Lopez, M. A.

AU - El-Bouanani, M.

AU - Kim, M. J.

AU - Gnade, B. E.

AU - Wallace, R. M.

AU - Visokay, M. R.

AU - Lifatou, A.

AU - Bevan, M. J.

AU - Colombo, L.

PY - 2002/8/5

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U2 - 10.1063/1.1498872

DO - 10.1063/1.1498872

M3 - Article

SP - 1074

EP - 1076

JO - Applied Physics Letters

JF - Applied Physics Letters

SN - 0003-6951

ER -

Quevedo-Lopez MA, El-Bouanani M, Kim MJ, Gnade BE, Wallace RM, Visokay MR et al. Boron penetration studies from p<sup>+</sup>polycrystalline Si through HfSi<inf>x</inf>O<inf>y</inf> Applied Physics Letters. 2002 Aug 5;1074-1076. https://doi.org/10.1063/1.1498872