Charge trapping dependence on the physical structure of ultra-thin ALD-HfSiON/TiN gate stacks

Siddarth A. Krishnan, M. A. Quevedo-Lopez, Rino Choi, Paul D. Kirsch, Chadwin Young, Rusty Harris, Jeff J. Peterson, Hong Jyh Li, Byoung Hun Lee, Jack C. Lee

Research output: Contribution to conferencePaper

3 Scopus citations
Original languageAmerican English
Pages89-90
Number of pages2
DOIs
StatePublished - 1 Dec 2005
EventIEEE International Integrated Reliability Workshop Final Report -
Duration: 18 Mar 2016 → …

Conference

ConferenceIEEE International Integrated Reliability Workshop Final Report
Period18/03/16 → …

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    Krishnan, S. A., Quevedo-Lopez, M. A., Choi, R., Kirsch, P. D., Young, C., Harris, R., Peterson, J. J., Li, H. J., Lee, B. H., & Lee, J. C. (2005). Charge trapping dependence on the physical structure of ultra-thin ALD-HfSiON/TiN gate stacks. 89-90. Paper presented at IEEE International Integrated Reliability Workshop Final Report, . https://doi.org/10.1109/IRWS.2005.1609570