Chemical characteristics via quantitative photoelectron analysis of chemical-solution-deposited yttrium oxide thin films for metal-insulator-metal capacitor applications

Engineering & Materials Science

• Photoelectrons 100%
• Yttrium oxide 95%
• Oxide films 79%
• Thin films 60%
• Capacitors 50%
• Metals 41%
• Annealing 27%
• Binding energy 14%
• Gate dielectrics 13%
• X ray photoelectron spectroscopy 11%
• Spectroscopy 10%
• Thermogravimetric analysis 10%
• Leakage currents 9%
• Transparency 9%
• X ray diffraction 9%
• Capacitance 7%
• Transistors 7%
• Topology 6%
• Hot Temperature 4%
• Costs 3%

Physics & Astronomy

• yttrium oxides 87%
• photoelectrons 57%
• capacitors 55%
• insulators 47%
• thin films 32%
• metals 32%
• annealing 16%
• surface roughness 15%
• pinholes 10%
• x rays 8%
• baths 8%
• topology 7%
• binding energy 7%
• leakage 7%
• photoelectron spectroscopy 7%
• methodology 7%
• capacitance 7%
• transistors 7%
• costs 6%
• synthesis 6%
• characterization 5%
• configurations 4%
• diffraction 4%
• spectroscopy 4%
• performance 4%

Chemistry

• Photoelectron 66%
• Capacitor 65%
• Annealing 21%
• Application 20%
• Surface Roughness 18%
• Liquid Film 17%
• Dielectric Material 16%
• Leakage Current 12%
• Photoelectron Spectrum 10%
• Transparency 9%
• Binding Energy 8%
• Optical Property 6%
• Thermogravimetric Analysis 6%
• X-Ray Photoelectron Spectroscopy 6%
• Amorphous Material 6%
• Shape 5%
• Spectroscopy 5%
• Chemical Transformation 5%
• X-Ray Diffraction 4%
• Surface 2%