Chemical characteristics via quantitative photoelectron analysis of chemical-solution-deposited yttrium oxide thin films for metal-insulator-metal capacitor applications

M. A. Ruiz-Molina, G. Suárez-Campos, D. Cabrera-German, D. Berman-Mendoza, H. Hu, M. Sotelo-Lerma*

*Corresponding author for this work

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Engineering & Materials Science

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Chemistry