Original language | American English |
---|---|
Journal | Applied Physics Letters |
DOIs | |
State | Published - 28 Jul 2006 |
Externally published | Yes |
Comparison of electrical and chemical characteristics of ultrathin HfON versus HfSiON dielectrics
G. Pant, A. Gnade, M. J. Kim, R. M. Wallace, B. E. Gnade, M. A. Quevedo-Lopez, P. D. Kirsch, S. Krishnan
Research output: Contribution to journal › Article › peer-review
34
Scopus
citations