Comparison of electrical and chemical characteristics of ultrathin HfON versus HfSiON dielectrics

G. Pant, A. Gnade, M. J. Kim, R. M. Wallace, B. E. Gnade, M. A. Quevedo-Lopez, P. D. Kirsch, S. Krishnan

Research output: Contribution to journalArticle

34 Scopus citations
Original languageAmerican English
JournalApplied Physics Letters
DOIs
StatePublished - 28 Jul 2006
Externally publishedYes

Fingerprint Dive into the research topics of 'Comparison of electrical and chemical characteristics of ultrathin HfON versus HfSiON dielectrics'. Together they form a unique fingerprint.

  • Cite this