Comparison of electrical and chemical characteristics of ultrathin HfON versus HfSiON dielectrics

G. Pant, A. Gnade, M. J. Kim, R. M. Wallace, B. E. Gnade, M. A. Quevedo-Lopez, P. D. Kirsch, S. Krishnan

Research output: Contribution to journalArticlepeer-review

34 Scopus citations

Fingerprint Dive into the research topics of 'Comparison of electrical and chemical characteristics of ultrathin HfON versus HfSiON dielectrics'. Together they form a unique fingerprint.

Physics & Astronomy