Comparison of HfCl<inf>4</inf>, HfI<inf>4</inf>, TEMA-Hf, and TDMA-Hf as precursors in early growing stages of HfO<inf>2</inf>films deposited by ALD: A DFT study

M. Cortez-Valadez; C. Fierro; J. R. Farias-Mancilla; A. Vargas-Ortiz; M. Flores-Acosta; R. Ramírez-Bon; J. L. Enriquez-Carrejo; C. Soubervielle-Montalvo; P. G. Mani-Gonzalez

doi:10.1016/j.chemphys.2016.03.008

Comparison of HfCl<inf>4</inf>, HfI<inf>4</inf>, TEMA-Hf, and TDMA-Hf as precursors in early growing stages of HfO<inf>2</inf>films deposited by ALD: A DFT study

M. Cortez-Valadez, C. Fierro, J. R. Farias-Mancilla, A. Vargas-Ortiz, M. Flores-Acosta, R. Ramírez-Bon, J. L. Enriquez-Carrejo, C. Soubervielle-Montalvo, P. G. Mani-Gonzalez

Departamento de Investigación en Física

Research output: Contribution to journal › Article

5 Scopus citations

Original language	American English
Pages (from-to)	81-88
Number of pages	8
Journal	Chemical Physics
DOIs	https://doi.org/10.1016/j.chemphys.2016.03.008
State	Published - 15 Jun 2016

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Cortez-Valadez, M., Fierro, C., Farias-Mancilla, J. R., Vargas-Ortiz, A., Flores-Acosta, M., Ramírez-Bon, R., Enriquez-Carrejo, J. L., Soubervielle-Montalvo, C., & Mani-Gonzalez, P. G. (2016). Comparison of HfCl<inf>4</inf>, HfI<inf>4</inf>, TEMA-Hf, and TDMA-Hf as precursors in early growing stages of HfO<inf>2</inf>films deposited by ALD: A DFT study. Chemical Physics, 81-88. https://doi.org/10.1016/j.chemphys.2016.03.008

Cortez-Valadez, M. ; Fierro, C. ; Farias-Mancilla, J. R. ; Vargas-Ortiz, A. ; Flores-Acosta, M. ; Ramírez-Bon, R. ; Enriquez-Carrejo, J. L. ; Soubervielle-Montalvo, C. ; Mani-Gonzalez, P. G. / Comparison of HfCl<inf>4</inf>, HfI<inf>4</inf>, TEMA-Hf, and TDMA-Hf as precursors in early growing stages of HfO<inf>2</inf>films deposited by ALD: A DFT study. In: Chemical Physics. 2016 ; pp. 81-88.

@article{dc221b8133d14fb5a82aacf55fd4fc2f,

title = "Comparison of HfCl4, HfI4, TEMA-Hf, and TDMA-Hf as precursors in early growing stages of HfO2films deposited by ALD: A DFT study",

author = "M. Cortez-Valadez and C. Fierro and Farias-Mancilla, {J. R.} and A. Vargas-Ortiz and M. Flores-Acosta and R. Ram{\'i}rez-Bon and Enriquez-Carrejo, {J. L.} and C. Soubervielle-Montalvo and Mani-Gonzalez, {P. G.}",

year = "2016",

month = jun,

day = "15",

doi = "10.1016/j.chemphys.2016.03.008",

language = "American English",

pages = "81--88",

journal = "Chemical Physics",

issn = "0301-0104",

publisher = "Elsevier",

}

Cortez-Valadez, M, Fierro, C, Farias-Mancilla, JR, Vargas-Ortiz, A, Flores-Acosta, M, Ramírez-Bon, R, Enriquez-Carrejo, JL, Soubervielle-Montalvo, C & Mani-Gonzalez, PG 2016, 'Comparison of HfCl<inf>4</inf>, HfI<inf>4</inf>, TEMA-Hf, and TDMA-Hf as precursors in early growing stages of HfO<inf>2</inf>films deposited by ALD: A DFT study', Chemical Physics, pp. 81-88. https://doi.org/10.1016/j.chemphys.2016.03.008

Comparison of HfCl<inf>4</inf>, HfI<inf>4</inf>, TEMA-Hf, and TDMA-Hf as precursors in early growing stages of HfO<inf>2</inf>films deposited by ALD: A DFT study. / Cortez-Valadez, M.; Fierro, C.; Farias-Mancilla, J. R.; Vargas-Ortiz, A.; Flores-Acosta, M.; Ramírez-Bon, R.; Enriquez-Carrejo, J. L.; Soubervielle-Montalvo, C.; Mani-Gonzalez, P. G.

In: Chemical Physics, 15.06.2016, p. 81-88.

Research output: Contribution to journal › Article

TY - JOUR

T1 - Comparison of HfCl4, HfI4, TEMA-Hf, and TDMA-Hf as precursors in early growing stages of HfO2films deposited by ALD: A DFT study

AU - Cortez-Valadez, M.

AU - Fierro, C.

AU - Farias-Mancilla, J. R.

AU - Vargas-Ortiz, A.

AU - Flores-Acosta, M.

AU - Ramírez-Bon, R.

AU - Enriquez-Carrejo, J. L.

AU - Soubervielle-Montalvo, C.

AU - Mani-Gonzalez, P. G.

PY - 2016/6/15

Y1 - 2016/6/15

U2 - 10.1016/j.chemphys.2016.03.008

DO - 10.1016/j.chemphys.2016.03.008

M3 - Article

SP - 81

EP - 88

JO - Chemical Physics

JF - Chemical Physics

SN - 0301-0104

ER -