Comparison of HfCl<inf>4</inf>, HfI<inf>4</inf>, TEMA-Hf, and TDMA-Hf as precursors in early growing stages of HfO<inf>2</inf>films deposited by ALD: A DFT study

M. Cortez-Valadez, C. Fierro, J. R. Farias-Mancilla, A. Vargas-Ortiz, M. Flores-Acosta, R. Ramírez-Bon, J. L. Enriquez-Carrejo, C. Soubervielle-Montalvo, P. G. Mani-Gonzalez

Research output: Contribution to journalArticle

5 Scopus citations
Original languageAmerican English
Pages (from-to)81-88
Number of pages8
JournalChemical Physics
DOIs
StatePublished - 15 Jun 2016

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