Original language | American English |
---|---|
Pages (from-to) | 81-88 |
Number of pages | 8 |
Journal | Chemical Physics |
DOIs | |
State | Published - 15 Jun 2016 |
Comparison of HfCl<inf>4</inf>, HfI<inf>4</inf>, TEMA-Hf, and TDMA-Hf as precursors in early growing stages of HfO<inf>2</inf>films deposited by ALD: A DFT study
M. Cortez-Valadez, C. Fierro, J. R. Farias-Mancilla, A. Vargas-Ortiz, M. Flores-Acosta, R. Ramírez-Bon, J. L. Enriquez-Carrejo, C. Soubervielle-Montalvo, P. G. Mani-Gonzalez
Research output: Contribution to journal › Article › peer-review
5
Scopus
citations