Abstract
Positive bias instability stress (PBI) and hot carrier injection stress (HCI) was done on ZnO thin-film transistors (TFTs) with 100°C Al2O3. The threshold voltage (VT), transconductance (gm), and subthreshold slope (SS) were monitored. HCI stress with two intermittent sense measurements where the first IDS-VGS is measured at the drain contact and the second is measured at the source contact to separate the contribution of the hot carrier and cold carrier injection on the VT shift. PBI stress was done to determine the viability of the carrier injection separation using only HCI.
Original language | English |
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Title of host publication | 2020 IEEE Silicon Nanoelectronics Workshop, SNW 2020 |
Publisher | Institute of Electrical and Electronics Engineers Inc. |
Pages | 73-74 |
Number of pages | 2 |
ISBN (Electronic) | 9781728197357 |
DOIs | |
State | Published - Jun 2020 |
Event | 2020 IEEE Silicon Nanoelectronics Workshop, SNW 2020 - Honolulu, United States Duration: 13 Jun 2020 → 14 Jun 2020 |
Publication series
Name | 2020 IEEE Silicon Nanoelectronics Workshop, SNW 2020 |
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Conference
Conference | 2020 IEEE Silicon Nanoelectronics Workshop, SNW 2020 |
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Country/Territory | United States |
City | Honolulu |
Period | 13/06/20 → 14/06/20 |
Bibliographical note
Publisher Copyright:© 2020 IEEE.
Keywords
- AlO
- HCI
- PBI
- TFTs
- V
- ZnO