@conference{1b2c75483cd643969b0b68e133f7f28d,
title = "Device and reliability improvement of HfSiON+LaOx/Metal gate stacks for 22nm node application",
author = "J. Huang and Kirsch, {P. D.} and D. Heh and Kang, {C. Y.} and G. Bersuker and M. Hussain and P. Majhi and P. Sivasubramani and Gilmer, {D. C.} and N. Goel and Quevedo-Lopez, {M. A.} and C. Young and Park, {C. S.} and C. Park and Hung, {P. Y.} and J. Price and Harris, {H. R.} and Lee, {B. H.} and Tseng, {H. H.} and R. Jammy",
year = "2008",
month = dec,
day = "1",
doi = "10.1109/IEDM.2008.4796609",
language = "American English",
note = "Technical Digest - International Electron Devices Meeting, IEDM ; Conference date: 01-12-2008",
}