Effect of flow rate, nitrogen precursor and diluent on Si2N 2O deposition by HYSYCVD

A.L. Leal-Cruz, M.I. Pech-Canul, E. Lara-Curzio, R.M. Trejo, R. Peascoe

Research output: Book/ReportBookpeer-review

Original languageUndefined/Unknown
StatePublished - 2009

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