Effect of Flow Rate, Nitrogen Precursor and Diluent on Si2N2O Deposition by HYSYCVD

A.L. Leal-Cruz, M.I. Pech-Canul, E. Lara-Curzio, R.M. Trejo, R. Peascoe

Research output: Book/ReportBookResearchpeer-review

Original languageUndefined/Unknown
DOIs
StatePublished - 2009

Cite this

Leal-Cruz, A.L. ; Pech-Canul, M.I. ; Lara-Curzio, E. ; Trejo, R.M. ; Peascoe, R. / Effect of Flow Rate, Nitrogen Precursor and Diluent on Si2N2O Deposition by HYSYCVD. 2009.
@book{947533d97dab492c9b9bc5838c7784c8,
title = "Effect of Flow Rate, Nitrogen Precursor and Diluent on Si2N2O Deposition by HYSYCVD",
author = "A.L. Leal-Cruz and M.I. Pech-Canul and E. Lara-Curzio and R.M. Trejo and R. Peascoe",
year = "2009",
doi = "10.1002/9780470522189.ch4",
language = "Indefinido/desconocido",

}

Effect of Flow Rate, Nitrogen Precursor and Diluent on Si2N2O Deposition by HYSYCVD. / Leal-Cruz, A.L.; Pech-Canul, M.I.; Lara-Curzio, E.; Trejo, R.M.; Peascoe, R.

2009.

Research output: Book/ReportBookResearchpeer-review

TY - BOOK

T1 - Effect of Flow Rate, Nitrogen Precursor and Diluent on Si2N2O Deposition by HYSYCVD

AU - Leal-Cruz, A.L.

AU - Pech-Canul, M.I.

AU - Lara-Curzio, E.

AU - Trejo, R.M.

AU - Peascoe, R.

PY - 2009

Y1 - 2009

UR - http://www.scopus.com/inward/record.url?eid=2-s2.0-84955410339&partnerID=MN8TOARS

U2 - 10.1002/9780470522189.ch4

DO - 10.1002/9780470522189.ch4

M3 - Libro

BT - Effect of Flow Rate, Nitrogen Precursor and Diluent on Si2N2O Deposition by HYSYCVD

ER -