Effect of Flow Rate, Nitrogen Precursor and Diluent on Si<inf>2</inf>N<inf>2</inf>O Deposition by HYSYCVD

A. L. Leal-Cruz, M. I. Pech-Canul, E. Lara-Curzio, R. M. Trejo, R. Peascoe

Research output: Chapter in Book/Report/Conference proceedingChapterResearch

Original languageAmerican English
Title of host publicationProcessing and Properties of Advanced Ceramics and Composites: Ceramic Transactions
Number of pages8
ISBN (Electronic)9780470522189
DOIs
StatePublished - 5 Jun 2009
Externally publishedYes

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nitrogen
ammonia
ceramics
experimental design
scanning electron microscopy
X-ray diffraction
rate
effect
temperature
chemical
trial
fibre
parameter
method

Cite this

Leal-Cruz, A. L., Pech-Canul, M. I., Lara-Curzio, E., Trejo, R. M., & Peascoe, R. (2009). Effect of Flow Rate, Nitrogen Precursor and Diluent on Si<inf>2</inf>N<inf>2</inf>O Deposition by HYSYCVD. In Processing and Properties of Advanced Ceramics and Composites: Ceramic Transactions https://doi.org/10.1002/9780470522189.ch4
Leal-Cruz, A. L. ; Pech-Canul, M. I. ; Lara-Curzio, E. ; Trejo, R. M. ; Peascoe, R. / Effect of Flow Rate, Nitrogen Precursor and Diluent on Si<inf>2</inf>N<inf>2</inf>O Deposition by HYSYCVD. Processing and Properties of Advanced Ceramics and Composites: Ceramic Transactions. 2009.
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Leal-Cruz, AL, Pech-Canul, MI, Lara-Curzio, E, Trejo, RM & Peascoe, R 2009, Effect of Flow Rate, Nitrogen Precursor and Diluent on Si<inf>2</inf>N<inf>2</inf>O Deposition by HYSYCVD. in Processing and Properties of Advanced Ceramics and Composites: Ceramic Transactions. https://doi.org/10.1002/9780470522189.ch4

Effect of Flow Rate, Nitrogen Precursor and Diluent on Si<inf>2</inf>N<inf>2</inf>O Deposition by HYSYCVD. / Leal-Cruz, A. L.; Pech-Canul, M. I.; Lara-Curzio, E.; Trejo, R. M.; Peascoe, R.

Processing and Properties of Advanced Ceramics and Composites: Ceramic Transactions. 2009.

Research output: Chapter in Book/Report/Conference proceedingChapterResearch

TY - CHAP

T1 - Effect of Flow Rate, Nitrogen Precursor and Diluent on Si2N2O Deposition by HYSYCVD

AU - Leal-Cruz, A. L.

AU - Pech-Canul, M. I.

AU - Lara-Curzio, E.

AU - Trejo, R. M.

AU - Peascoe, R.

PY - 2009/6/5

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BT - Processing and Properties of Advanced Ceramics and Composites: Ceramic Transactions

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Leal-Cruz AL, Pech-Canul MI, Lara-Curzio E, Trejo RM, Peascoe R. Effect of Flow Rate, Nitrogen Precursor and Diluent on Si<inf>2</inf>N<inf>2</inf>O Deposition by HYSYCVD. In Processing and Properties of Advanced Ceramics and Composites: Ceramic Transactions. 2009 https://doi.org/10.1002/9780470522189.ch4