Effect of N incorporation on boron penetration from p+polycrystalline-Si through HfSixOy films

M. A. Quevedo-Lopez, M. El-Bouanani, M. J. Kim, B. E. Gnade, R. M. Wallace, M. R. Visokay, A. LiFatou, J. J. Chambers, L. Colombo

Research output: Contribution to journalArticlepeer-review

59 Scopus citations
Original languageAmerican English
Pages (from-to)4669-4671
Number of pages3
JournalApplied Physics Letters
DOIs
StatePublished - 30 Jun 2003
Externally publishedYes

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