Effect of processing parameters on the deposition rate of Si 3N4/Si2N2O by chemical vapor infiltration and the in situ thermal decomposition of Na2SiF 6

M. I. Pech-Canul*, J. L. De La Peña, A. L. Leal-Cruz

*Corresponding author for this work

Research output: Contribution to journal › Article › peer-review

14 Scopus citations

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Engineering & Materials Science

Chemistry