Electrical bias stressing and radiation induced charge trapping in HfO <inf>2</inf>/SiO<inf>2</inf> dielectric stacks

R. A.B. Devine, T. Busani, Manuel Quevedo-Lopez, H. N. Alshareef

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@article{572bf82f4023486094758effc0142e9d,

title = "Electrical bias stressing and radiation induced charge trapping in HfO 2/SiO2 dielectric stacks",

author = "Devine, {R. A.B.} and T. Busani and Manuel Quevedo-Lopez and Alshareef, {H. N.}",

year = "2007",

month = jun,

day = "11",

doi = "10.1063/1.2727435",

language = "American English",

journal = "Journal of Applied Physics",

issn = "0021-8979",

publisher = "American Institute of Physics",

}

TY - JOUR

T1 - Electrical bias stressing and radiation induced charge trapping in HfO 2/SiO2 dielectric stacks

AU - Devine, R. A.B.

AU - Busani, T.

AU - Quevedo-Lopez, Manuel

AU - Alshareef, H. N.

PY - 2007/6/11

Y1 - 2007/6/11

U2 - 10.1063/1.2727435

DO - 10.1063/1.2727435

M3 - Article

JO - Journal of Applied Physics

JF - Journal of Applied Physics

SN - 0021-8979

ER -