Electrical bias stressing and radiation induced charge trapping in HfO <inf>2</inf>/SiO<inf>2</inf> dielectric stacks

R. A.B. Devine, T. Busani, Manuel Quevedo-Lopez, H. N. Alshareef

Research output: Contribution to journalArticle

7 Scopus citations
Original languageAmerican English
JournalJournal of Applied Physics
DOIs
StatePublished - 11 Jun 2007
Externally publishedYes

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