Original language | American English |
---|---|
Journal | Journal of Applied Physics |
DOIs | |
State | Published - 11 Jun 2007 |
Externally published | Yes |
Electrical bias stressing and radiation induced charge trapping in HfO <inf>2</inf>/SiO<inf>2</inf> dielectric stacks
R. A.B. Devine, T. Busani, Manuel Quevedo-Lopez, H. N. Alshareef
Research output: Contribution to journal › Article › peer-review
7
Scopus
citations