Electrical stress in CdS thin film transistors using HfO<inf>2</inf> gate dielectric

R. García, I. Mejia, J. E. Molinar-Solis, A. L. Salas-Villasenor, A. Morales, B. García, M. A. Quevedo-Lopez, M. Alemán

Research output: Contribution to journalArticlepeer-review

7 Scopus citations
Original languageAmerican English
JournalApplied Physics Letters
DOIs
StatePublished - 20 May 2013
Externally publishedYes

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