Erratum: Effect of N incorporation on boron penetration from p<sup>+</sup>polycrystalline-Si through HfSi<inf>x</inf>O<inf>y</inf>films (Applied Physics Letters (2003) 82 (4669))

M. A. Quevedo-Lopez, M. El-Bouanani, M. J. Kim, B. E. Gnade, R. M. Wallace, M. R. Visokay, A. LiFatou, J. J. Chambers, L. Colombo

Research output: Contribution to journalErratumpeer-review

2 Scopus citations
Original languageAmerican English
Pages (from-to)1679
Number of pages1
JournalApplied Physics Letters
StatePublished - 25 Aug 2003
Externally publishedYes

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