Original language | American English |
---|---|
Pages (from-to) | 1679 |
Number of pages | 1 |
Journal | Applied Physics Letters |
DOIs | |
State | Published - 25 Aug 2003 |
Externally published | Yes |
Erratum: Effect of N incorporation on boron penetration from p<sup>+</sup>polycrystalline-Si through HfSi<inf>x</inf>O<inf>y</inf>films (Applied Physics Letters (2003) 82 (4669))
M. A. Quevedo-Lopez, M. El-Bouanani, M. J. Kim, B. E. Gnade, R. M. Wallace, M. R. Visokay, A. LiFatou, J. J. Chambers, L. Colombo
Research output: Contribution to journal › Erratum › peer-review
2
Scopus
citations