Exchange-diffusion reactions in HfSiON during annealing studied by Rutherford backscattering spectrometry, nuclear reaction analysis and narrow resonant nuclear reaction profiling

L. Miotti, K. P. Bastos, G. V. Soares, C. Driemeier, R. P. Pezzi, J. Morais, I. J.R. Baumvol, A. L.P. Rotondaro, M. R. Visokay, J. J. Chambers, M. Quevedo-Lopez, L. Colombo

Research output: Contribution to conferencePaper

12 Scopus citations
Original languageAmerican English
Pages4460-4462
Number of pages3
DOIs
StatePublished - 8 Nov 2004
Externally publishedYes
EventApplied Physics Letters -
Duration: 8 Nov 2004 → …

Conference

ConferenceApplied Physics Letters
Period8/11/04 → …

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    Miotti, L., Bastos, K. P., Soares, G. V., Driemeier, C., Pezzi, R. P., Morais, J., Baumvol, I. J. R., Rotondaro, A. L. P., Visokay, M. R., Chambers, J. J., Quevedo-Lopez, M., & Colombo, L. (2004). Exchange-diffusion reactions in HfSiON during annealing studied by Rutherford backscattering spectrometry, nuclear reaction analysis and narrow resonant nuclear reaction profiling. 4460-4462. Paper presented at Applied Physics Letters, . https://doi.org/10.1063/1.1812814