Skip to main navigation Skip to search Skip to main content

Exchange-diffusion reactions in HfSiON during annealing studied by Rutherford backscattering spectrometry, nuclear reaction analysis and narrow resonant nuclear reaction profiling

  • L. Miotti
  • , K. P. Bastos
  • , G. V. Soares
  • , C. Driemeier
  • , R. P. Pezzi
  • , J. Morais
  • , I. J.R. Baumvol
  • , A. L.P. Rotondaro*
  • , M. R. Visokay
  • , J. J. Chambers
  • , M. Quevedo-Lopez
  • , L. Colombo
  • *Corresponding author for this work

Research output: Contribution to journalArticlepeer-review

Fingerprint

Dive into the research topics of 'Exchange-diffusion reactions in HfSiON during annealing studied by Rutherford backscattering spectrometry, nuclear reaction analysis and narrow resonant nuclear reaction profiling'. Together they form a unique fingerprint.
Sort by

Keyphrases

Chemistry

Material Science