Hot carrier stress investigation of zinc oxide thin film transistors with an al2o3 gate dielectric

Rodolfo A. Rodriguez-Davila, Israel Mejia, Manuel Quevedo-Lopez, Chadwin D. Young

Research output: Contribution to conferencePaper

4 Scopus citations

Abstract

© 2018 IEEE. Hot carrier stress, where the gate and drain voltages were stressed simultaneously, was executed on ZnO thin-film transistors (TFTs) with different PLD ZnO or ALD Al2O3 deposition parameters. The threshold voltage and transconductance were monitored where 30 mTorr samples had greater threshold voltage shifts and transconductance (gm) degradation compared to the 20 mTorr ZnO film. For samples with and without a 400°C forming gas anneal, greater degradation was seen in the annealed sample, which indicates 400°C may be too aggressive. The correlation between gm degradation (i.e., interface degradation) and Δ Vt demonstrate that there is influence to the Vt shift from electrically active defects generated in the interfacial region.
Original languageAmerican English
DOIs
StatePublished - 30 Aug 2018
Externally publishedYes
EventProceedings of the International Symposium on the Physical and Failure Analysis of Integrated Circuits, IPFA -
Duration: 30 Aug 2018 → …

Conference

ConferenceProceedings of the International Symposium on the Physical and Failure Analysis of Integrated Circuits, IPFA
Period30/08/18 → …

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