Impact of Al<inf>2</inf>O<inf>3</inf> deposition temperature on the performance and initial stability of nanocrystalline ZnO thin-film transistors

R. A. Rodriguez-Davila, R. A. Chapman, P. Bolshakov, C. D. Young, M. Quevedo-Lopez

Research output: Contribution to journal › Article › peer-review

Original language	American English
Journal	Microelectronic Engineering
DOIs	https://doi.org/10.1016/j.mee.2019.111114
State	Published - 15 Sep 2019
Externally published	Yes

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title = "Impact of Al2O3 deposition temperature on the performance and initial stability of nanocrystalline ZnO thin-film transistors",

author = "Rodriguez-Davila, {R. A.} and Chapman, {R. A.} and P. Bolshakov and Young, {C. D.} and M. Quevedo-Lopez",

year = "2019",

month = sep,

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doi = "10.1016/j.mee.2019.111114",

language = "American English",

journal = "Microelectronic Engineering",

issn = "0167-9317",

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AU - Rodriguez-Davila, R. A.

AU - Chapman, R. A.

AU - Bolshakov, P.

AU - Young, C. D.

AU - Quevedo-Lopez, M.

PY - 2019/9/15

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DO - 10.1016/j.mee.2019.111114

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JF - Microelectronic Engineering

SN - 0167-9317

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