Increasing permittivity in HfZrO thin films by surface manipulation

T. S. Böscke, P. Y. Hung, P. D. Kirsch, M. A. Quevedo-Lopez, R. Ramírez-Bon

Research output: Contribution to journalArticleResearchpeer-review

38 Citations (Scopus)
Original languageAmerican English
JournalApplied Physics Letters
DOIs
StatePublished - 14 Aug 2009
Externally publishedYes

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manipulators
x ray diffraction
permittivity
concentrating
thin films
surface energy
infrared spectroscopy
thermodynamics
physics

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Böscke, T. S., Hung, P. Y., Kirsch, P. D., Quevedo-Lopez, M. A., & Ramírez-Bon, R. (2009). Increasing permittivity in HfZrO thin films by surface manipulation. Applied Physics Letters. https://doi.org/10.1063/1.3195623
Böscke, T. S. ; Hung, P. Y. ; Kirsch, P. D. ; Quevedo-Lopez, M. A. ; Ramírez-Bon, R. / Increasing permittivity in HfZrO thin films by surface manipulation. In: Applied Physics Letters. 2009.
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Böscke, TS, Hung, PY, Kirsch, PD, Quevedo-Lopez, MA & Ramírez-Bon, R 2009, 'Increasing permittivity in HfZrO thin films by surface manipulation', Applied Physics Letters. https://doi.org/10.1063/1.3195623

Increasing permittivity in HfZrO thin films by surface manipulation. / Böscke, T. S.; Hung, P. Y.; Kirsch, P. D.; Quevedo-Lopez, M. A.; Ramírez-Bon, R.

In: Applied Physics Letters, 14.08.2009.

Research output: Contribution to journalArticleResearchpeer-review

TY - JOUR

T1 - Increasing permittivity in HfZrO thin films by surface manipulation

AU - Böscke, T. S.

AU - Hung, P. Y.

AU - Kirsch, P. D.

AU - Quevedo-Lopez, M. A.

AU - Ramírez-Bon, R.

PY - 2009/8/14

Y1 - 2009/8/14

U2 - 10.1063/1.3195623

DO - 10.1063/1.3195623

M3 - Article

JO - Applied Physics Letters

JF - Applied Physics Letters

SN - 0003-6951

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Böscke TS, Hung PY, Kirsch PD, Quevedo-Lopez MA, Ramírez-Bon R. Increasing permittivity in HfZrO thin films by surface manipulation. Applied Physics Letters. 2009 Aug 14. https://doi.org/10.1063/1.3195623