Influence of annealing temperature on nickel oxide thin films grown by chemical bath deposition

M. Martínez-Gil; M. I. Pintor-Monroy; M. Cota-Leal; D. Cabrera-German; A. Garzon-Fontecha; M. A. Quevedo-López; M. Sotelo-Lerma

doi:10.1016/j.mssp.2017.09.021

Influence of annealing temperature on nickel oxide thin films grown by chemical bath deposition

M. Martínez-Gil, M. I. Pintor-Monroy, M. Cota-Leal, D. Cabrera-German, A. Garzon-Fontecha, M. A. Quevedo-López, M. Sotelo-Lerma

Research output: Contribution to journal › Article

11 Scopus citations

Original language	American English
Pages (from-to)	37-45
Number of pages	9
Journal	Materials Science in Semiconductor Processing
DOIs	https://doi.org/10.1016/j.mssp.2017.09.021
State	Published - 1 Dec 2017

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Martínez-Gil, M., Pintor-Monroy, M. I., Cota-Leal, M., Cabrera-German, D., Garzon-Fontecha, A., Quevedo-López, M. A., & Sotelo-Lerma, M. (2017). Influence of annealing temperature on nickel oxide thin films grown by chemical bath deposition. Materials Science in Semiconductor Processing, 37-45. https://doi.org/10.1016/j.mssp.2017.09.021

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title = "Influence of annealing temperature on nickel oxide thin films grown by chemical bath deposition",

author = "M. Mart{\'i}nez-Gil and Pintor-Monroy, {M. I.} and M. Cota-Leal and D. Cabrera-German and A. Garzon-Fontecha and Quevedo-L{\'o}pez, {M. A.} and M. Sotelo-Lerma",

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AU - Martínez-Gil, M.

AU - Pintor-Monroy, M. I.

AU - Cota-Leal, M.

AU - Cabrera-German, D.

AU - Garzon-Fontecha, A.

AU - Quevedo-López, M. A.

AU - Sotelo-Lerma, M.

PY - 2017/12/1

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DO - 10.1016/j.mssp.2017.09.021

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EP - 45

JO - Materials Science in Semiconductor Processing

JF - Materials Science in Semiconductor Processing

SN - 1369-8001

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