| Original language | American English |
|---|---|
| Pages (from-to) | 37-45 |
| Number of pages | 9 |
| Journal | Materials Science in Semiconductor Processing |
| DOIs | |
| State | Published - 1 Dec 2017 |
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Influence of annealing temperature on nickel oxide thin films grown by chemical bath deposition. / Martínez-Gil, M.; Pintor-Monroy, M. I.; Cota-Leal, M.; Cabrera-German, D.; Garzon-Fontecha, A.; Quevedo-López, M. A.; Sotelo-Lerma, M.
In: Materials Science in Semiconductor Processing, 01.12.2017, p. 37-45.Research output: Contribution to journal › Article
TY - JOUR
T1 - Influence of annealing temperature on nickel oxide thin films grown by chemical bath deposition
AU - Martínez-Gil, M.
AU - Pintor-Monroy, M. I.
AU - Cota-Leal, M.
AU - Cabrera-German, D.
AU - Garzon-Fontecha, A.
AU - Quevedo-López, M. A.
AU - Sotelo-Lerma, M.
PY - 2017/12/1
Y1 - 2017/12/1
U2 - 10.1016/j.mssp.2017.09.021
DO - 10.1016/j.mssp.2017.09.021
M3 - Article
SP - 37
EP - 45
JO - Materials Science in Semiconductor Processing
JF - Materials Science in Semiconductor Processing
SN - 1369-8001
ER -