Influence of annealing temperature on nickel oxide thin films grown by chemical bath deposition

M. Martínez-Gil, M. I. Pintor-Monroy, M. Cota-Leal, D. Cabrera-German, A. Garzon-Fontecha, M. A. Quevedo-López, M. Sotelo-Lerma

Research output: Contribution to journalArticleResearchpeer-review

7 Citations (Scopus)
Original languageAmerican English
Pages (from-to)37-45
Number of pages9
JournalMaterials Science in Semiconductor Processing
DOIs
StatePublished - 1 Dec 2017

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Nickel oxide
nickel oxides
Oxide films
baths
Ionization potential
Annealing
Thin films
annealing
Energy gap
thin films
Nickel sulfates
Triethanolamine
ionization
worms
Hall effect
Photoelectron spectroscopy
Temperature
Diffraction patterns
temperature
sulfates

Cite this

Martínez-Gil, M., Pintor-Monroy, M. I., Cota-Leal, M., Cabrera-German, D., Garzon-Fontecha, A., Quevedo-López, M. A., & Sotelo-Lerma, M. (2017). Influence of annealing temperature on nickel oxide thin films grown by chemical bath deposition. Materials Science in Semiconductor Processing, 37-45. https://doi.org/10.1016/j.mssp.2017.09.021
Martínez-Gil, M. ; Pintor-Monroy, M. I. ; Cota-Leal, M. ; Cabrera-German, D. ; Garzon-Fontecha, A. ; Quevedo-López, M. A. ; Sotelo-Lerma, M. / Influence of annealing temperature on nickel oxide thin films grown by chemical bath deposition. In: Materials Science in Semiconductor Processing. 2017 ; pp. 37-45.
@article{93cb05330dad4d3e91e7292d202c1b84,
title = "Influence of annealing temperature on nickel oxide thin films grown by chemical bath deposition",
author = "M. Mart{\'i}nez-Gil and Pintor-Monroy, {M. I.} and M. Cota-Leal and D. Cabrera-German and A. Garzon-Fontecha and Quevedo-L{\'o}pez, {M. A.} and M. Sotelo-Lerma",
year = "2017",
month = "12",
day = "1",
doi = "10.1016/j.mssp.2017.09.021",
language = "American English",
pages = "37--45",
journal = "Materials Science in Semiconductor Processing",
issn = "1369-8001",
publisher = "Elsevier Ltd",

}

Influence of annealing temperature on nickel oxide thin films grown by chemical bath deposition. / Martínez-Gil, M.; Pintor-Monroy, M. I.; Cota-Leal, M.; Cabrera-German, D.; Garzon-Fontecha, A.; Quevedo-López, M. A.; Sotelo-Lerma, M.

In: Materials Science in Semiconductor Processing, 01.12.2017, p. 37-45.

Research output: Contribution to journalArticleResearchpeer-review

TY - JOUR

T1 - Influence of annealing temperature on nickel oxide thin films grown by chemical bath deposition

AU - Martínez-Gil, M.

AU - Pintor-Monroy, M. I.

AU - Cota-Leal, M.

AU - Cabrera-German, D.

AU - Garzon-Fontecha, A.

AU - Quevedo-López, M. A.

AU - Sotelo-Lerma, M.

PY - 2017/12/1

Y1 - 2017/12/1

U2 - 10.1016/j.mssp.2017.09.021

DO - 10.1016/j.mssp.2017.09.021

M3 - Article

SP - 37

EP - 45

JO - Materials Science in Semiconductor Processing

JF - Materials Science in Semiconductor Processing

SN - 1369-8001

ER -

Martínez-Gil M, Pintor-Monroy MI, Cota-Leal M, Cabrera-German D, Garzon-Fontecha A, Quevedo-López MA et al. Influence of annealing temperature on nickel oxide thin films grown by chemical bath deposition. Materials Science in Semiconductor Processing. 2017 Dec 1;37-45. https://doi.org/10.1016/j.mssp.2017.09.021