Influence of annealing temperature on nickel oxide thin films grown by chemical bath deposition

M. Martínez-Gil; M. I. Pintor-Monroy; M. Cota-Leal; D. Cabrera-German; A. Garzon-Fontecha; M. A. Quevedo-López; M. Sotelo-Lerma

doi:10.1016/j.mssp.2017.09.021

Influence of annealing temperature on nickel oxide thin films grown by chemical bath deposition

M. Martínez-Gil, M. I. Pintor-Monroy, M. Cota-Leal, D. Cabrera-German, A. Garzon-Fontecha, M. A. Quevedo-López, M. Sotelo-Lerma

Research output: Contribution to journal › Article › peer-review

11 Scopus citations

Original language	American English
Pages (from-to)	37-45
Number of pages	9
Journal	Materials Science in Semiconductor Processing
DOIs	https://doi.org/10.1016/j.mssp.2017.09.021
State	Published - 1 Dec 2017

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10.1016/j.mssp.2017.09.021

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title = "Influence of annealing temperature on nickel oxide thin films grown by chemical bath deposition",

author = "M. Mart{\'i}nez-Gil and Pintor-Monroy, {M. I.} and M. Cota-Leal and D. Cabrera-German and A. Garzon-Fontecha and Quevedo-L{\'o}pez, {M. A.} and M. Sotelo-Lerma",

year = "2017",

month = dec,

day = "1",

doi = "10.1016/j.mssp.2017.09.021",

language = "American English",

pages = "37--45",

journal = "Materials Science in Semiconductor Processing",

issn = "1369-8001",

publisher = "Elsevier Ltd",

}

Influence of annealing temperature on nickel oxide thin films grown by chemical bath deposition. / Martínez-Gil, M.; Pintor-Monroy, M. I.; Cota-Leal, M.; Cabrera-German, D.; Garzon-Fontecha, A.; Quevedo-López, M. A.; Sotelo-Lerma, M.

In: Materials Science in Semiconductor Processing, 01.12.2017, p. 37-45.

Research output: Contribution to journal › Article › peer-review

TY - JOUR

T1 - Influence of annealing temperature on nickel oxide thin films grown by chemical bath deposition

AU - Martínez-Gil, M.

AU - Pintor-Monroy, M. I.

AU - Cota-Leal, M.

AU - Cabrera-German, D.

AU - Garzon-Fontecha, A.

AU - Quevedo-López, M. A.

AU - Sotelo-Lerma, M.

PY - 2017/12/1

Y1 - 2017/12/1

U2 - 10.1016/j.mssp.2017.09.021

DO - 10.1016/j.mssp.2017.09.021

M3 - Article

SP - 37

EP - 45

JO - Materials Science in Semiconductor Processing

JF - Materials Science in Semiconductor Processing

SN - 1369-8001

ER -