Original language | American English |
---|---|
Pages (from-to) | 37-45 |
Number of pages | 9 |
Journal | Materials Science in Semiconductor Processing |
DOIs | |
State | Published - 1 Dec 2017 |
Influence of annealing temperature on nickel oxide thin films grown by chemical bath deposition
M. Martínez-Gil, M. I. Pintor-Monroy, M. Cota-Leal, D. Cabrera-German, A. Garzon-Fontecha, M. A. Quevedo-López, M. Sotelo-Lerma
Research output: Contribution to journal › Article › peer-review
11
Scopus
citations