Influence of pH on properties of ZnS thin films deposited on SiO<inf>2</inf> substrate by chemical bath deposition

P. A. Luque; A. Castro-Beltran; A. R. Vilchis-Nestor; M. A. Quevedo-Lopez; A. Olivas

doi:10.1016/j.matlet.2014.10.167

Influence of pH on properties of ZnS thin films deposited on SiO<inf>2</inf> substrate by chemical bath deposition

P. A. Luque, A. Castro-Beltran, A. R. Vilchis-Nestor, M. A. Quevedo-Lopez, A. Olivas

Departamento de Investigación en Polímeros y Materiales

Research output: Contribution to journal › Article › peer-review

Abstract

© 2014 Elsevier B.V. All rights reserved. This work focuses on the study of zinc sulfide (ZnS) thin films prepared by chemical bath deposition. The effect of the pH ranging from 10.0 to 10.75 on quality of ZnS thin films on SiO2 substrate is investigated. The effect of pH on the surface showed that the variation of pH has a significant effect on the morphology of the ZnS thin films. The sample with pH value of 10.50 was uniform, free of agglomerates with band gap energy about 3.67 eV. The resistivity of ZnS thin films on SiO2 substrate with different pH value were about 107 ω cm.

Original language	American English
Pages (from-to)	148-150
Number of pages	3
Journal	Materials Letters
DOIs	https://doi.org/10.1016/j.matlet.2014.10.167
State	Published - 1 Feb 2015

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title = "Influence of pH on properties of ZnS thin films deposited on SiO2 substrate by chemical bath deposition",

abstract = "{\textcopyright} 2014 Elsevier B.V. All rights reserved. This work focuses on the study of zinc sulfide (ZnS) thin films prepared by chemical bath deposition. The effect of the pH ranging from 10.0 to 10.75 on quality of ZnS thin films on SiO2 substrate is investigated. The effect of pH on the surface showed that the variation of pH has a significant effect on the morphology of the ZnS thin films. The sample with pH value of 10.50 was uniform, free of agglomerates with band gap energy about 3.67 eV. The resistivity of ZnS thin films on SiO2 substrate with different pH value were about 107 ω cm.",

author = "Luque, {P. A.} and A. Castro-Beltran and Vilchis-Nestor, {A. R.} and Quevedo-Lopez, {M. A.} and A. Olivas",

year = "2015",

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doi = "10.1016/j.matlet.2014.10.167",

language = "American English",

pages = "148--150",

journal = "Materials Letters",

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TY - JOUR

T1 - Influence of pH on properties of ZnS thin films deposited on SiO2 substrate by chemical bath deposition

AU - Luque, P. A.

AU - Castro-Beltran, A.

AU - Vilchis-Nestor, A. R.

AU - Quevedo-Lopez, M. A.

AU - Olivas, A.

PY - 2015/2/1

Y1 - 2015/2/1

N2 - © 2014 Elsevier B.V. All rights reserved. This work focuses on the study of zinc sulfide (ZnS) thin films prepared by chemical bath deposition. The effect of the pH ranging from 10.0 to 10.75 on quality of ZnS thin films on SiO2 substrate is investigated. The effect of pH on the surface showed that the variation of pH has a significant effect on the morphology of the ZnS thin films. The sample with pH value of 10.50 was uniform, free of agglomerates with band gap energy about 3.67 eV. The resistivity of ZnS thin films on SiO2 substrate with different pH value were about 107 ω cm.

AB - © 2014 Elsevier B.V. All rights reserved. This work focuses on the study of zinc sulfide (ZnS) thin films prepared by chemical bath deposition. The effect of the pH ranging from 10.0 to 10.75 on quality of ZnS thin films on SiO2 substrate is investigated. The effect of pH on the surface showed that the variation of pH has a significant effect on the morphology of the ZnS thin films. The sample with pH value of 10.50 was uniform, free of agglomerates with band gap energy about 3.67 eV. The resistivity of ZnS thin films on SiO2 substrate with different pH value were about 107 ω cm.

U2 - 10.1016/j.matlet.2014.10.167

DO - 10.1016/j.matlet.2014.10.167

M3 - Article

SN - 0167-577X

SP - 148

EP - 150

JO - Materials Letters

JF - Materials Letters

ER -

Influence of pH on properties of ZnS thin films deposited on SiO<inf>2</inf> substrate by chemical bath deposition

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