Original language | American English |
---|---|
Pages (from-to) | 3540-3550 |
Number of pages | 11 |
Journal | Journal of Applied Physics |
DOIs | |
State | Published - 1 Oct 2002 |
Externally published | Yes |
Interdiffusion studies for HfSi<inf>x</inf>O<inf>y</inf>and ZrSi<inf>x</inf>O<inf>y</inf>on Si
M. A. Quevedo-Lopez, M. El-Bouanani, B. E. Gnade, R. M. Wallace, M. R. Visokay, M. Douglas, M. J. Bevan, L. Colombo
Research output: Contribution to journal › Article › peer-review
55
Scopus
citations