Interdiffusion studies for HfSi<inf>x</inf>O<inf>y</inf>and ZrSi<inf>x</inf>O<inf>y</inf>on Si

M. A. Quevedo-Lopez, M. El-Bouanani, B. E. Gnade, R. M. Wallace, M. R. Visokay, M. Douglas, M. J. Bevan, L. Colombo

Research output: Contribution to journalArticle

55 Scopus citations
Original languageAmerican English
Pages (from-to)3540-3550
Number of pages11
JournalJournal of Applied Physics
DOIs
StatePublished - 1 Oct 2002
Externally publishedYes

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    Quevedo-Lopez, M. A., El-Bouanani, M., Gnade, B. E., Wallace, R. M., Visokay, M. R., Douglas, M., Bevan, M. J., & Colombo, L. (2002). Interdiffusion studies for HfSi<inf>x</inf>O<inf>y</inf>and ZrSi<inf>x</inf>O<inf>y</inf>on Si. Journal of Applied Physics, 3540-3550. https://doi.org/10.1063/1.1501752