Engineering & Materials Science
Hafnium oxides
100%
Thin film devices
94%
Shape-memory polymer
80%
Thin film transistors
72%
High-k dielectric
44%
Atomic layer deposition
43%
Polymers
41%
Gate dielectrics
40%
Gallium
40%
Substrates
40%
Zinc oxide
37%
Indium
36%
Oxide films
35%
Thermosets
34%
Electric breakdown
31%
Leakage currents
30%
Permittivity
28%
Annealing
28%
Chemical activation
25%
Elastic moduli
23%
Capacitors
22%
Gases
16%
Temperature
11%
Physics & Astronomy
hafnium oxides
77%
softening
55%
life (durability)
38%
polymers
33%
thin films
29%
transistors
22%
gallium oxides
18%
thiols
17%
acrylates
17%
atomic layer epitaxy
14%
zinc oxides
13%
indium
13%
stimuli
13%
capacitors
12%
leakage
11%
projection
11%
activation
11%
breakdown
11%
permittivity
9%
annealing
8%
gases
7%
temperature
4%
Chemistry
Hafnium Atom
67%
Dielectric Material
50%
Shape
37%
Dimension
32%
Oxide
30%
Leakage Current
18%
Atomic Layer Epitaxy
16%
Storage Modulus
15%
Capacitor
14%
Dielectric Constant
12%
Acrylate
12%
Annealing
11%
Compound Mobility
10%
Gas
7%
Liquid Film
6%