Metal gate work function engineering using AlN<inf>x</inf>interfacial layers

H. N. Alshareef, H. F. Luan, K. Choi, H. R. Harris, H. C. Wen, M. A. Quevedo-Lopez, P. Majhi, B. H. Lee

Research output: Contribution to journalArticle

57 Scopus citations
Original languageAmerican English
JournalApplied Physics Letters
DOIs
StatePublished - 30 Mar 2006
Externally publishedYes

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    Alshareef, H. N., Luan, H. F., Choi, K., Harris, H. R., Wen, H. C., Quevedo-Lopez, M. A., Majhi, P., & Lee, B. H. (2006). Metal gate work function engineering using AlN<inf>x</inf>interfacial layers. Applied Physics Letters. https://doi.org/10.1063/1.2186517