Modulation of argon pressure as an option to control transmittance and resistivity of ZnO:Al films deposited by DC magnetron sputtering: on the dark yellow films at 10-7 Torr base pressures

Jorge Alberto García Valenzuela, Dagoberto Cabrera-German, Marcos Cota-Leal, Guillermo Suárez-Campos, Miguel Martínez-Gil, Frank Romo-García, Martha Raquel Baez-Gaxiola, Mérida Sotelo-Lerma, Jordi Andreu, Joan Bertomeu

Research output: Contribution to journalArticle

1 Scopus citations
Original languageUndefined/Unknown
JournalRevista Mexicana de Fisica
DOIs
StatePublished - Oct 2018

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