Modulation of argon pressure as an option to control transmittance and resistivity of ZnO:Al films deposited by DC magnetron sputtering: on the dark yellow films at 10-7 Torr base pressures

Jorge Alberto García Valenzuela; Dagoberto Cabrera-German; Marcos Cota-Leal; Guillermo Suárez-Campos; Miguel Martínez-Gil; Frank Romo-García; Martha Raquel Baez-Gaxiola; Mérida Sotelo-Lerma; Jordi Andreu; Joan Bertomeu

doi:10.31349/revmexfis.64.566

Modulation of argon pressure as an option to control transmittance and resistivity of ZnO:Al films deposited by DC magnetron sputtering: on the dark yellow films at 10-7 Torr base pressures

Jorge Alberto García Valenzuela, Dagoberto Cabrera-German, Marcos Cota-Leal, Guillermo Suárez-Campos, Miguel Martínez-Gil, Frank Romo-García, Martha Raquel Baez-Gaxiola, Mérida Sotelo-Lerma, Jordi Andreu, Joan Bertomeu

Departamento de Investigación en Polímeros y Materiales

Research output: Contribution to journal › Article

1 Scopus citations

Original language	Undefined/Unknown
Journal	Revista Mexicana de Fisica
DOIs	https://doi.org/10.31349/revmexfis.64.566
State	Published - Oct 2018

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10.31349/revmexfis.64.566

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Valenzuela, J. A. G., Cabrera-German, D., Cota-Leal, M., Suárez-Campos, G., Martínez-Gil, M., Romo-García, F., Baez-Gaxiola, M. R., Sotelo-Lerma, M., Andreu, J., & Bertomeu, J. (2018). Modulation of argon pressure as an option to control transmittance and resistivity of ZnO:Al films deposited by DC magnetron sputtering: on the dark yellow films at 10-7 Torr base pressures. Revista Mexicana de Fisica. https://doi.org/10.31349/revmexfis.64.566

Valenzuela, Jorge Alberto García ; Cabrera-German, Dagoberto ; Cota-Leal, Marcos ; Suárez-Campos, Guillermo ; Martínez-Gil, Miguel ; Romo-García, Frank ; Baez-Gaxiola, Martha Raquel ; Sotelo-Lerma, Mérida ; Andreu, Jordi ; Bertomeu, Joan. / Modulation of argon pressure as an option to control transmittance and resistivity of ZnO:Al films deposited by DC magnetron sputtering: on the dark yellow films at 10-7 Torr base pressures. In: Revista Mexicana de Fisica. 2018.

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title = "Modulation of argon pressure as an option to control transmittance and resistivity of ZnO:Al films deposited by DC magnetron sputtering: on the dark yellow films at 10-7 Torr base pressures",

author = "Valenzuela, {Jorge Alberto Garc{\'i}a} and Dagoberto Cabrera-German and Marcos Cota-Leal and Guillermo Su{\'a}rez-Campos and Miguel Mart{\'i}nez-Gil and Frank Romo-Garc{\'i}a and Baez-Gaxiola, {Martha Raquel} and M{\'e}rida Sotelo-Lerma and Jordi Andreu and Joan Bertomeu",

year = "2018",

month = oct,

doi = "10.31349/revmexfis.64.566",

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journal = "Revista Mexicana de Fisica",

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Valenzuela, JAG, Cabrera-German, D, Cota-Leal, M, Suárez-Campos, G, Martínez-Gil, M, Romo-García, F, Baez-Gaxiola, MR, Sotelo-Lerma, M, Andreu, J & Bertomeu, J 2018, 'Modulation of argon pressure as an option to control transmittance and resistivity of ZnO:Al films deposited by DC magnetron sputtering: on the dark yellow films at 10-7 Torr base pressures', Revista Mexicana de Fisica. https://doi.org/10.31349/revmexfis.64.566

Modulation of argon pressure as an option to control transmittance and resistivity of ZnO:Al films deposited by DC magnetron sputtering: on the dark yellow films at 10-7 Torr base pressures. / Valenzuela, Jorge Alberto García; Cabrera-German, Dagoberto; Cota-Leal, Marcos; Suárez-Campos, Guillermo; Martínez-Gil, Miguel; Romo-García, Frank; Baez-Gaxiola, Martha Raquel; Sotelo-Lerma, Mérida; Andreu, Jordi; Bertomeu, Joan.

In: Revista Mexicana de Fisica, 10.2018.

Research output: Contribution to journal › Article

TY - JOUR

T1 - Modulation of argon pressure as an option to control transmittance and resistivity of ZnO:Al films deposited by DC magnetron sputtering: on the dark yellow films at 10-7 Torr base pressures

AU - Valenzuela, Jorge Alberto García

AU - Cabrera-German, Dagoberto

AU - Cota-Leal, Marcos

AU - Suárez-Campos, Guillermo

AU - Martínez-Gil, Miguel

AU - Romo-García, Frank

AU - Baez-Gaxiola, Martha Raquel

AU - Sotelo-Lerma, Mérida

AU - Andreu, Jordi

AU - Bertomeu, Joan

PY - 2018/10

Y1 - 2018/10

U2 - 10.31349/revmexfis.64.566

DO - 10.31349/revmexfis.64.566

M3 - Artículo

JO - Revista Mexicana de Fisica

JF - Revista Mexicana de Fisica

SN - 0035-001X

ER -

Valenzuela JAG, Cabrera-German D, Cota-Leal M, Suárez-Campos G, Martínez-Gil M, Romo-García F et al. Modulation of argon pressure as an option to control transmittance and resistivity of ZnO:Al films deposited by DC magnetron sputtering: on the dark yellow films at 10-7 Torr base pressures. Revista Mexicana de Fisica. 2018 Oct. https://doi.org/10.31349/revmexfis.64.566