© 2016, Inst Materials Physics. All rights reserved. The alpha type silicon nitride nanostructured fibers were obtained by hybrid system chemical vapor deposition (HYSY-CVD) method, with low manufacturing costs, fabricating good quality deposits at atmospheric pressure. The α-Si3N4fibers on silicon wafers <111> were produced with a diameter between 400 to 500 nm using a temperature of 1200 °C. FTIR showed that the deposit is free of hydrogen and study shows Raman vibrational modes corresponding to α-Si3N4.
|Original language||American English|
|Number of pages||5|
|Journal||Digest Journal of Nanomaterials and Biostructures|
|State||Published - 1 Apr 2016|