Nucleation and growth of diamond thin films: The role of temperature and pressure

J. Morales, R. Bernal, C. Cruz-Vazquez, E. G. Salcido-Romero, V. M. Castaño

Research output: Contribution to conferencePaper

Abstract

Diamond thin films were deposited onto Si (100) substrates using liquid a solution of water and acetone, ethanol, methanol and commercial Tequila as precursors by the Pulsed Liquid Injection Chemical Vapor Deposition (PLICVD) technique. Temperature was varied from 550°C to 850°C. In this work we attempted to find a crystal diameter dependence on temperature and pressure from the experimental data. The goal in this work is to found a function that can be adjusted to the experimental data. © Materials Research Society.
Original languageAmerican English
Pages32-39
Number of pages8
StatePublished - 1 Dec 2010
EventMaterials Research Society Symposium Proceedings -
Duration: 1 Dec 2010 → …

Conference

ConferenceMaterials Research Society Symposium Proceedings
Period1/12/10 → …

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