Nucleation and growth of diamond thin films: The role of temperature and pressure

J. Morales*, R. Bernal, C. Cruz-Vazquez, E. G. Salcido-Romero, V. M. Castaño

*Corresponding author for this work

Research output: Chapter in Book/Report/Conference proceedingConference contributionpeer-review


Diamond thin films were deposited onto Si (100) substrates using liquid a solution of water and acetone, ethanol, methanol and commercial Tequila as precursors by the Pulsed Liquid Injection Chemical Vapor Deposition (PLICVD) technique. Temperature was varied from 550°C to 850°C. In this work we attempted to find a crystal diameter dependence on temperature and pressure from the experimental data. The goal in this work is to found a function that can be adjusted to the experimental data.

Original languageEnglish
Title of host publicationComposite, Hybrid Materials and Ecomaterials
PublisherMaterials Research Society
Number of pages8
ISBN (Print)9781617820960
StatePublished - 2010

Publication series

NameMaterials Research Society Symposium Proceedings
ISSN (Print)0272-9172


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