Optical and structural analysis of ammonia-free cooper sulphide thin films using chemical deposition method

S. J. Castillo, A. Apolinar-Iribe*, Aned De León, C. Ruvalcaba-Cornejo

*Corresponding author for this work

Research output: Contribution to journalArticlepeer-review

3 Scopus citations

Abstract

We report the synthesis of cooper sulphide thin films ammonia-free by chemical bath method using triethanolamine and barium hydroxide as chelating agents and were deposited on glass microscope slides at 600°C. The use of these complexing agents improving the adhesion of the deposited films and reduces of time reaction. The structural characterization was carried out by X-ray diffraction and atomic force microscopic. The X-ray diffraction analysis showed a amorphous nature of thin film and indirect transition with a bandgap of 1.28 eV and index refraction of the 1.515.

Original languageEnglish
Pages (from-to)1258-1261
Number of pages4
JournalJournal of Optoelectronics and Advanced Materials
Volume13
Issue number10
StatePublished - Oct 2011

Keywords

  • Chemical deposition
  • CuS
  • Thin film

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