Phosphorus and arsenic penetration studies through HfSi<inf>x</inf>O <inf>y</inf> and HfSi<inf>x</inf>O<inf>y</inf>N<inf>z</inf> films

M. A. Quevedo-Lopez, M. El-Bouanani, M. J. Kim, B. E. Gnade, R. M. Wallace, M. R. Visokay, A. Li-Fatou, M. J. Bevan, L. Colombo

Research output: Contribution to journalArticlepeer-review

37 Scopus citations
Original languageAmerican English
Pages (from-to)1609-1611
Number of pages3
JournalApplied Physics Letters
DOIs
StatePublished - 26 Aug 2002
Externally publishedYes

Fingerprint Dive into the research topics of 'Phosphorus and arsenic penetration studies through HfSi<inf>x</inf>O <inf>y</inf> and HfSi<inf>x</inf>O<inf>y</inf>N<inf>z</inf> films'. Together they form a unique fingerprint.

Cite this