TY - GEN
T1 - Quadrant photodiode for electronic processing
AU - Vera-Marquina, Alicia
AU - Diaz Sanchez, Alejandro
AU - Rocha-Pérez, J. Miguel
AU - Berman-Mendoza, D.
AU - Padilla, Ivan
PY - 2009
Y1 - 2009
N2 - In this work, a photodiode for the visible spectral range, which will be integrated monolithically with CMOS circuits, is presented. Such Optoelectronic Integrated Circuit (OEIC) with high sensitivity in the 400-900 nm spectral range is utilized to realize electronic processing from the light beam position that hit a specific area of the photodetector. The output signals with voltages of 0V and 3 V can be implemented with a controller circuit. By the Using of He-Ne Laser at 633 nm as incident light, the responsivity of the Position Sense Photodetector (PSPD) was 0.35 A/W and the rise and fall time of less than 30 ns were achieved. These parameters were necessaries to achieve the photodiode integration in an industrial 0.5 μm CMOS process, only additional mask was needed in order to block out the threshold voltage implantation in the photo-active region. Therefore both designs of photodiode and the electronic processing circuit separately, are shown here, all design will be integrated monolithically in the same Silicon chip.
AB - In this work, a photodiode for the visible spectral range, which will be integrated monolithically with CMOS circuits, is presented. Such Optoelectronic Integrated Circuit (OEIC) with high sensitivity in the 400-900 nm spectral range is utilized to realize electronic processing from the light beam position that hit a specific area of the photodetector. The output signals with voltages of 0V and 3 V can be implemented with a controller circuit. By the Using of He-Ne Laser at 633 nm as incident light, the responsivity of the Position Sense Photodetector (PSPD) was 0.35 A/W and the rise and fall time of less than 30 ns were achieved. These parameters were necessaries to achieve the photodiode integration in an industrial 0.5 μm CMOS process, only additional mask was needed in order to block out the threshold voltage implantation in the photo-active region. Therefore both designs of photodiode and the electronic processing circuit separately, are shown here, all design will be integrated monolithically in the same Silicon chip.
KW - CMOS technology
KW - Optoelectronic Integrated Circuit
KW - Quadrant Detector
KW - Silicon bulk
UR - http://www.scopus.com/inward/record.url?scp=70449595550&partnerID=8YFLogxK
U2 - 10.1117/12.825520
DO - 10.1117/12.825520
M3 - Contribución a la conferencia
AN - SCOPUS:70449595550
SN - 9780819477095
T3 - Proceedings of SPIE - The International Society for Optical Engineering
BT - Infrared Systems and Photoelectronic Technology IV
T2 - Infrared Systems and Photoelectronic Technology IV
Y2 - 4 August 2009 through 6 August 2009
ER -