Radiation response of nanometric HfSiON/ SiO<inf>2</inf>gate stacks

R. A.B. Devine, M. A. Quevedo-Lopez, H. Alshareef

Research output: Contribution to journalArticle

1 Scopus citations
Original languageAmerican English
JournalJournal of Applied Physics
DOIs
StatePublished - 8 Apr 2008
Externally publishedYes

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