Resistance and resistivities of pbs thin films using polyethylenimine by chemical bath deposition

J. O. Rivera-Nieblas, J. Alvarado-Rivera, M. C. Acosta-Enríquez, R. Ochoa-Landin, F. J. Espinoza-Beltrán, A. Apolinar-Iribe, M. Flores-Acosta, A. de León, S. J. Castillo

Research output: Contribution to journalArticle

Abstract

In this work resistance and resistivities of PbS thin films by chemical bath deposition using Polyethylenimine as complexing agent are presented. A series of resistance and resistivity values of thin films obtained at different deposition times of 7, 10 and 13 minutes were evaluated and compared. The obtained films were chemically characterized by X-Ray Photoelectron and Raman spectroscopy confirming the presence of lead and sulfur as PbS. Thickness of the films was measured by ellipsometric spectroscopy; the values were in the range of 80 to 100 nm. Resistivity of the films was measured indirectly using an integrator circuit, the results show that resistivity values vary as a function of the deposition time. PEI films showed a low transmission in the visible range about 2 to 5% and an irregular absorption in the range of 300 to 1050 nm. Roughness of the films was characterized by atomic force microscopy showing values of mean square roughness of 16 nm, presenting different orientation of the clusters and pyramidal shapes.
Original languageAmerican English
Pages (from-to)349-358
Number of pages10
JournalChalcogenide Letters
Volume10
Issue number9
StatePublished - 2013

Fingerprint

Polyethyleneimine
baths
Thin films
electrical resistivity
thin films
roughness
Surface roughness
Polyetherimides
integrators
Sulfur
Raman spectroscopy
Atomic force microscopy
sulfur
X ray photoelectron spectroscopy
Lead
photoelectron spectroscopy
atomic force microscopy
Spectroscopy
Networks (circuits)
spectroscopy

Keywords

  • Chemical bath deposition
  • Lead sulfide
  • Polyethylenimine
  • Thin films

Cite this

@article{960f3e1b9021411b8ae688223984d93a,
title = "Resistance and resistivities of pbs thin films using polyethylenimine by chemical bath deposition",
abstract = "In this work resistance and resistivities of PbS thin films by chemical bath deposition using Polyethylenimine as complexing agent are presented. A series of resistance and resistivity values of thin films obtained at different deposition times of 7, 10 and 13 minutes were evaluated and compared. The obtained films were chemically characterized by X-Ray Photoelectron and Raman spectroscopy confirming the presence of lead and sulfur as PbS. Thickness of the films was measured by ellipsometric spectroscopy; the values were in the range of 80 to 100 nm. Resistivity of the films was measured indirectly using an integrator circuit, the results show that resistivity values vary as a function of the deposition time. PEI films showed a low transmission in the visible range about 2 to 5{\%} and an irregular absorption in the range of 300 to 1050 nm. Roughness of the films was characterized by atomic force microscopy showing values of mean square roughness of 16 nm, presenting different orientation of the clusters and pyramidal shapes.",
keywords = "Chemical bath deposition, Lead sulfide, Polyethylenimine, Thin films",
author = "Rivera-Nieblas, {J. O.} and J. Alvarado-Rivera and Acosta-Enr{\'i}quez, {M. C.} and R. Ochoa-Landin and Espinoza-Beltr{\'a}n, {F. J.} and A. Apolinar-Iribe and M. Flores-Acosta and {de Le{\'o}n}, A. and Castillo, {S. J.}",
year = "2013",
language = "American English",
volume = "10",
pages = "349--358",
journal = "Chalcogenide Letters",
issn = "1584-8663",
publisher = "National Institute R and D of Materials Physics",
number = "9",

}

Resistance and resistivities of pbs thin films using polyethylenimine by chemical bath deposition. / Rivera-Nieblas, J. O.; Alvarado-Rivera, J.; Acosta-Enríquez, M. C.; Ochoa-Landin, R.; Espinoza-Beltrán, F. J.; Apolinar-Iribe, A.; Flores-Acosta, M.; de León, A.; Castillo, S. J.

In: Chalcogenide Letters, Vol. 10, No. 9, 2013, p. 349-358.

Research output: Contribution to journalArticle

TY - JOUR

T1 - Resistance and resistivities of pbs thin films using polyethylenimine by chemical bath deposition

AU - Rivera-Nieblas, J. O.

AU - Alvarado-Rivera, J.

AU - Acosta-Enríquez, M. C.

AU - Ochoa-Landin, R.

AU - Espinoza-Beltrán, F. J.

AU - Apolinar-Iribe, A.

AU - Flores-Acosta, M.

AU - de León, A.

AU - Castillo, S. J.

PY - 2013

Y1 - 2013

N2 - In this work resistance and resistivities of PbS thin films by chemical bath deposition using Polyethylenimine as complexing agent are presented. A series of resistance and resistivity values of thin films obtained at different deposition times of 7, 10 and 13 minutes were evaluated and compared. The obtained films were chemically characterized by X-Ray Photoelectron and Raman spectroscopy confirming the presence of lead and sulfur as PbS. Thickness of the films was measured by ellipsometric spectroscopy; the values were in the range of 80 to 100 nm. Resistivity of the films was measured indirectly using an integrator circuit, the results show that resistivity values vary as a function of the deposition time. PEI films showed a low transmission in the visible range about 2 to 5% and an irregular absorption in the range of 300 to 1050 nm. Roughness of the films was characterized by atomic force microscopy showing values of mean square roughness of 16 nm, presenting different orientation of the clusters and pyramidal shapes.

AB - In this work resistance and resistivities of PbS thin films by chemical bath deposition using Polyethylenimine as complexing agent are presented. A series of resistance and resistivity values of thin films obtained at different deposition times of 7, 10 and 13 minutes were evaluated and compared. The obtained films were chemically characterized by X-Ray Photoelectron and Raman spectroscopy confirming the presence of lead and sulfur as PbS. Thickness of the films was measured by ellipsometric spectroscopy; the values were in the range of 80 to 100 nm. Resistivity of the films was measured indirectly using an integrator circuit, the results show that resistivity values vary as a function of the deposition time. PEI films showed a low transmission in the visible range about 2 to 5% and an irregular absorption in the range of 300 to 1050 nm. Roughness of the films was characterized by atomic force microscopy showing values of mean square roughness of 16 nm, presenting different orientation of the clusters and pyramidal shapes.

KW - Chemical bath deposition

KW - Lead sulfide

KW - Polyethylenimine

KW - Thin films

UR - http://www.mendeley.com/research/resistance-resistivities-pbs-thin-films-using-polyethylenimine-chemical-bath-deposition

M3 - Article

VL - 10

SP - 349

EP - 358

JO - Chalcogenide Letters

JF - Chalcogenide Letters

SN - 1584-8663

IS - 9

ER -