Keyphrases
Refractive Index
100%
Atomic Layer Deposition
100%
Alumina Film
100%
Structure Index
100%
Spectroscopic Ellipsometry
50%
Aluminum Oxide
33%
Growth Rate
16%
Silicon Substrate
16%
Scanning Electron Microscope Image
16%
Wavelength Range
16%
Optoelectronic Applications
16%
Dielectric Materials
16%
X-ray Photoelectron Spectroscopy Analysis
16%
Trimethylaluminum
16%
Deposition Temperature
16%
Surface Reaction
16%
N2 Purging
16%
Al2O3 Oxide
16%
Nitrogen Purging
16%
N-value
16%
Moderate Temperature
16%
Film Thickness
16%
Al2O3 Thin Films
16%
Depositional Cycle
16%
Purge Time
16%
Optical Reflectance
16%
Film Surface
16%
Ultrathin Films
16%
Engineering
Refractive Index
100%
Refractivity
100%
Atomic Layer Deposition
100%
Aluminum Oxide
100%
Deposited Film
33%
Silicon Substrate
16%
Dielectrics
16%
Thin Films
16%
Optoelectronics
16%
Ray Photoelectron Spectroscopy
16%
Reflectance
16%
Good Match
16%
Moderate Temperature
16%
Deposition Temperature
16%
Film Surface
16%
Material Science
Film
100%
Refractive Index
100%
Aluminum Oxide
100%
Surface (Surface Science)
28%
X-Ray Photoelectron Spectroscopy
14%
Silicon
14%
Dielectric Material
14%
Scanning Electron Microscopy
14%
Thin Films
14%
Film Deposition
14%
Surface Reaction
14%
Film Thickness
14%
Ultrathin Film
14%