Study of non-ideal effects in ZnO TFT’s

T. Mendivil-Reynoso; D. Berman-Mendoza; M. C. Acosta-Enríquez; L. Rojas-Blanco; L. P. Ramírez-Rodríguez; R. Ramírez-Bon; S. J. Castillo

Study of non-ideal effects in ZnO TFT’s

T. Mendivil-Reynoso, D. Berman-Mendoza, M. C. Acosta-Enríquez, L. Rojas-Blanco, L. P. Ramírez-Rodríguez^*, R. Ramírez-Bon, S. J. Castillo

^*Corresponding author for this work

Research output: Contribution to journal › Article › peer-review

Abstract

In this work we report the non-ideal effects on the performance of ZnO-based Thin Film Transistors (TFTs) as an active channel. This TFT was grown by RF magnetron sputtering technique. The transistor structure fabricated in this study consists of ZnO/SiO₂/n-Si/Au- Gate. The TFTs were done under two conditions: Depositing the active layer in the substrate with constant temperature of 150°C and with room temperature, both with different channel length of 10, 20, 40 and 80 μm, and constant channel width of 450 μm. In both conditions of temperature for the substrates, a typical behavior of the family curves I_DS vs V_DS was obtained. Channel length modulation, hot carrier, and long channel are some of the effects that occur in the transistors presented in this research. The motilities, threshold voltage, on/off rates and gate swing voltages were calculated. Also, conductance and transconductance were evaluated for all cases, which are related with non-ideal effects.

Original language	English
Pages (from-to)	103-111
Number of pages	9
Journal	Journal of Ovonic Research
Volume	12
Issue number	2
State	Published - 1 Mar 2016

Bibliographical note

Publisher Copyright:
© 2016, Virtual Institute of Physics of the Foundation Horia Hulubei. All rights reserved.

Keywords

MOSFET
Semiconductor
Transistor
ZnO

Cite this

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title = "Study of non-ideal effects in ZnO TFT{\textquoteright}s",

abstract = "In this work we report the non-ideal effects on the performance of ZnO-based Thin Film Transistors (TFTs) as an active channel. This TFT was grown by RF magnetron sputtering technique. The transistor structure fabricated in this study consists of ZnO/SiO2/n-Si/Au- Gate. The TFTs were done under two conditions: Depositing the active layer in the substrate with constant temperature of 150°C and with room temperature, both with different channel length of 10, 20, 40 and 80 μm, and constant channel width of 450 μm. In both conditions of temperature for the substrates, a typical behavior of the family curves IDS vs VDS was obtained. Channel length modulation, hot carrier, and long channel are some of the effects that occur in the transistors presented in this research. The motilities, threshold voltage, on/off rates and gate swing voltages were calculated. Also, conductance and transconductance were evaluated for all cases, which are related with non-ideal effects.",

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AU - Mendivil-Reynoso, T.

AU - Berman-Mendoza, D.

AU - Acosta-Enríquez, M. C.

AU - Rojas-Blanco, L.

AU - Ramírez-Rodríguez, L. P.

AU - Ramírez-Bon, R.

AU - Castillo, S. J.

PY - 2016/3/1

Y1 - 2016/3/1

N2 - In this work we report the non-ideal effects on the performance of ZnO-based Thin Film Transistors (TFTs) as an active channel. This TFT was grown by RF magnetron sputtering technique. The transistor structure fabricated in this study consists of ZnO/SiO2/n-Si/Au- Gate. The TFTs were done under two conditions: Depositing the active layer in the substrate with constant temperature of 150°C and with room temperature, both with different channel length of 10, 20, 40 and 80 μm, and constant channel width of 450 μm. In both conditions of temperature for the substrates, a typical behavior of the family curves IDS vs VDS was obtained. Channel length modulation, hot carrier, and long channel are some of the effects that occur in the transistors presented in this research. The motilities, threshold voltage, on/off rates and gate swing voltages were calculated. Also, conductance and transconductance were evaluated for all cases, which are related with non-ideal effects.

AB - In this work we report the non-ideal effects on the performance of ZnO-based Thin Film Transistors (TFTs) as an active channel. This TFT was grown by RF magnetron sputtering technique. The transistor structure fabricated in this study consists of ZnO/SiO2/n-Si/Au- Gate. The TFTs were done under two conditions: Depositing the active layer in the substrate with constant temperature of 150°C and with room temperature, both with different channel length of 10, 20, 40 and 80 μm, and constant channel width of 450 μm. In both conditions of temperature for the substrates, a typical behavior of the family curves IDS vs VDS was obtained. Channel length modulation, hot carrier, and long channel are some of the effects that occur in the transistors presented in this research. The motilities, threshold voltage, on/off rates and gate swing voltages were calculated. Also, conductance and transconductance were evaluated for all cases, which are related with non-ideal effects.

KW - MOSFET

KW - Semiconductor

KW - Transistor

KW - ZnO

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M3 - Artículo

SN - 1842-2403

VL - 12

SP - 103

EP - 111

JO - Journal of Ovonic Research

JF - Journal of Ovonic Research

IS - 2

ER -

Study of non-ideal effects in ZnO TFT’s

Abstract

Bibliographical note

Keywords

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