Systematic gate stack optimization to maximize mobility with HfSiON EOT scaling

M. A. Quevedo-Lopez; P. D. Kirsch; S. Krishnan; H. N. Alshareef; J. Barnett; H. R. Harris; A. Neugroschel; F. S. Aguirre-Tostado; B. E. Gnade; M. J. Kim; R. M. Wallace; B. H. Lee

Systematic gate stack optimization to maximize mobility with HfSiON EOT scaling

M. A. Quevedo-Lopez, P. D. Kirsch, S. Krishnan, H. N. Alshareef, J. Barnett, H. R. Harris, A. Neugroschel, F. S. Aguirre-Tostado, B. E. Gnade, M. J. Kim, R. M. Wallace, B. H. Lee

Research output: Contribution to conference › Paper

3 Scopus citations

Original language	American English
Pages	113-116
Number of pages	4
State	Published - 1 Jan 2006
Externally published	Yes
Event	ESSDERC 2006 - Proceedings of the 36th European Solid-State Device Research Conference - Duration: 1 Jan 2006 → …

Conference

Conference	ESSDERC 2006 - Proceedings of the 36th European Solid-State Device Research Conference
Period	1/01/06 → …

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Quevedo-Lopez, M. A., Kirsch, P. D., Krishnan, S., Alshareef, H. N., Barnett, J., Harris, H. R., Neugroschel, A., Aguirre-Tostado, F. S., Gnade, B. E., Kim, M. J., Wallace, R. M., & Lee, B. H. (2006). Systematic gate stack optimization to maximize mobility with HfSiON EOT scaling. 113-116. Paper presented at ESSDERC 2006 - Proceedings of the 36th European Solid-State Device Research Conference, . https://www.scopus.com/inward/record.uri?partnerID=HzOxMe3b&scp=84957870672&origin=inward

Quevedo-Lopez, M. A. ; Kirsch, P. D. ; Krishnan, S. ; Alshareef, H. N. ; Barnett, J. ; Harris, H. R. ; Neugroschel, A. ; Aguirre-Tostado, F. S. ; Gnade, B. E. ; Kim, M. J. ; Wallace, R. M. ; Lee, B. H. / Systematic gate stack optimization to maximize mobility with HfSiON EOT scaling. Paper presented at ESSDERC 2006 - Proceedings of the 36th European Solid-State Device Research Conference, .4 p.

@conference{c73a70ef2aa24ad697896fd3e57aeb57,

title = "Systematic gate stack optimization to maximize mobility with HfSiON EOT scaling",

author = "Quevedo-Lopez, {M. A.} and Kirsch, {P. D.} and S. Krishnan and Alshareef, {H. N.} and J. Barnett and Harris, {H. R.} and A. Neugroschel and Aguirre-Tostado, {F. S.} and Gnade, {B. E.} and Kim, {M. J.} and Wallace, {R. M.} and Lee, {B. H.}",

year = "2006",

month = jan,

day = "1",

language = "American English",

pages = "113--116",

note = "ESSDERC 2006 - Proceedings of the 36th European Solid-State Device Research Conference ; Conference date: 01-01-2006",

}

Quevedo-Lopez, MA, Kirsch, PD, Krishnan, S, Alshareef, HN, Barnett, J, Harris, HR, Neugroschel, A, Aguirre-Tostado, FS, Gnade, BE, Kim, MJ, Wallace, RM & Lee, BH 2006, 'Systematic gate stack optimization to maximize mobility with HfSiON EOT scaling', Paper presented at ESSDERC 2006 - Proceedings of the 36th European Solid-State Device Research Conference, 1/01/06 pp. 113-116. <https://www.scopus.com/inward/record.uri?partnerID=HzOxMe3b&scp=84957870672&origin=inward>

Systematic gate stack optimization to maximize mobility with HfSiON EOT scaling. / Quevedo-Lopez, M. A.; Kirsch, P. D.; Krishnan, S.; Alshareef, H. N.; Barnett, J.; Harris, H. R.; Neugroschel, A.; Aguirre-Tostado, F. S.; Gnade, B. E.; Kim, M. J.; Wallace, R. M.; Lee, B. H.

2006. 113-116 Paper presented at ESSDERC 2006 - Proceedings of the 36th European Solid-State Device Research Conference, .

Research output: Contribution to conference › Paper

TY - CONF

T1 - Systematic gate stack optimization to maximize mobility with HfSiON EOT scaling

AU - Quevedo-Lopez, M. A.

AU - Kirsch, P. D.

AU - Krishnan, S.

AU - Alshareef, H. N.

AU - Barnett, J.

AU - Harris, H. R.

AU - Neugroschel, A.

AU - Aguirre-Tostado, F. S.

AU - Gnade, B. E.

AU - Kim, M. J.

AU - Wallace, R. M.

AU - Lee, B. H.

PY - 2006/1/1

Y1 - 2006/1/1

M3 - Paper

SP - 113

EP - 116

T2 - ESSDERC 2006 - Proceedings of the 36th European Solid-State Device Research Conference

Y2 - 1 January 2006

ER -