Systematic gate stack optimization to maximize mobility with HfSiON EOT scaling

M. A. Quevedo-Lopez, P. D. Kirsch, S. Krishnan, H. N. Alshareef, J. Barnett, H. R. Harris, A. Neugroschel, F. S. Aguirre-Tostado, B. E. Gnade, M. J. Kim, R. M. Wallace, B. H. Lee

Research output: Contribution to conferencePaper

3 Scopus citations
Original languageAmerican English
Pages113-116
Number of pages4
StatePublished - 1 Jan 2006
Externally publishedYes
EventESSDERC 2006 - Proceedings of the 36th European Solid-State Device Research Conference -
Duration: 1 Jan 2006 → …

Conference

ConferenceESSDERC 2006 - Proceedings of the 36th European Solid-State Device Research Conference
Period1/01/06 → …

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    Quevedo-Lopez, M. A., Kirsch, P. D., Krishnan, S., Alshareef, H. N., Barnett, J., Harris, H. R., Neugroschel, A., Aguirre-Tostado, F. S., Gnade, B. E., Kim, M. J., Wallace, R. M., & Lee, B. H. (2006). Systematic gate stack optimization to maximize mobility with HfSiON EOT scaling. 113-116. Paper presented at ESSDERC 2006 - Proceedings of the 36th European Solid-State Device Research Conference, . https://www.scopus.com/inward/record.uri?partnerID=HzOxMe3b&scp=84957870672&origin=inward