Thermal stability of hafnium-silicate and plasma-nitrided hafnium silicate films studied by Fourier transform infrared spectroscopy

M. A. Quevedo-Lopez, J. J. Chambers, M. R. Visokay, A. Shanware, L. Colombo

Research output: Contribution to journalArticle

35 Scopus citations
Original languageAmerican English
JournalApplied Physics Letters
DOIs
StatePublished - 4 Jul 2005
Externally publishedYes

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