Thermal stability of Hf-based high-κ dielectric films on Si(100)

M. J. Kim, J. Huang, D. K. Cha, M. A. Quevedo-Lopez, R. M. Wallace, B. E. Gnade

Research output: Contribution to conferencePaper

Original languageAmerican English
Pages506-507
Number of pages2
StatePublished - 4 Sep 2003
Externally publishedYes
EventMicroscopy and Microanalysis -
Duration: 4 Sep 2003 → …

Conference

ConferenceMicroscopy and Microanalysis
Period4/09/03 → …

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