Thermal stability of Hf-based high-κ dielectric films on Si(100)

M. J. Kim, J. Huang, D. K. Cha, M. A. Quevedo-Lopez, R. M. Wallace, B. E. Gnade

Research output: Contribution to conferencePaper

Original languageAmerican English
Pages506-507
Number of pages2
StatePublished - 4 Sep 2003
Externally publishedYes
EventMicroscopy and Microanalysis -
Duration: 4 Sep 2003 → …

Conference

ConferenceMicroscopy and Microanalysis
Period4/09/03 → …

Cite this

Kim, M. J., Huang, J., Cha, D. K., Quevedo-Lopez, M. A., Wallace, R. M., & Gnade, B. E. (2003). Thermal stability of Hf-based high-κ dielectric films on Si(100). 506-507. Paper presented at Microscopy and Microanalysis, . https://www.scopus.com/inward/record.uri?partnerID=HzOxMe3b&scp=0042423420&origin=inward