Thermal stability of Hf-based high-κ dielectric films on Si(100)

M. J. Kim*, J. Huang, D. K. Cha, M. A. Quevedo-Lopez, R. M. Wallace, B. E. Gnade

*Corresponding author for this work

Research output: Contribution to journalArticlepeer-review

Original languageEnglish
Pages (from-to)506-507
Number of pages2
JournalMicroscopy and Microanalysis
Issue numberSUPPL. 2
StatePublished - 2003

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