Thermal stability of Hf-based high-κ dielectric films on Si(100)

M. J. Kim; J. Huang; D. K. Cha; M. A. Quevedo-Lopez; R. M. Wallace; B. E. Gnade

doi:10.1017/s1431927603442530

Thermal stability of Hf-based high-κ dielectric films on Si(100)

M. J. Kim^*, J. Huang, D. K. Cha, M. A. Quevedo-Lopez, R. M. Wallace, B. E. Gnade

^*Corresponding author for this work

Departamento de Investigación en Polímeros y Materiales

Research output: Contribution to journal › Article › peer-review

Original language	English
Pages (from-to)	506-507
Number of pages	2
Journal	Microscopy and Microanalysis
Volume	9
Issue number	SUPPL. 2
DOIs	https://doi.org/10.1017/s1431927603442530
State	Published - 2003

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title = "Thermal stability of Hf-based high-κ dielectric films on Si(100)",

author = "Kim, {M. J.} and J. Huang and Cha, {D. K.} and Quevedo-Lopez, {M. A.} and Wallace, {R. M.} and Gnade, {B. E.}",

year = "2003",

doi = "10.1017/s1431927603442530",

language = "Ingl{\'e}s",

volume = "9",

pages = "506--507",

journal = "Microscopy and Microanalysis",

issn = "1431-9276",

publisher = "Cambridge University Press",

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T1 - Thermal stability of Hf-based high-κ dielectric films on Si(100)

AU - Kim, M. J.

AU - Huang, J.

AU - Cha, D. K.

AU - Quevedo-Lopez, M. A.

AU - Wallace, R. M.

AU - Gnade, B. E.

PY - 2003

Y1 - 2003

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U2 - 10.1017/s1431927603442530

DO - 10.1017/s1431927603442530

M3 - Artículo

AN - SCOPUS:0042423420

SN - 1431-9276

VL - 9

SP - 506

EP - 507

JO - Microscopy and Microanalysis

JF - Microscopy and Microanalysis

IS - SUPPL. 2

ER -

Thermal stability of Hf-based high-κ dielectric films on Si(100)

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