Thermal stability of nitrogen in nitrided HfSiO2 / SiO2 /Si (001) ultrathin films

A. Herrera-Gomez, F. S. Aguirre-Tostado, M. A. Quevedo-Lopez, P. D. Kirsch, M. J. Kim, R. M. Wallace

Research output: Contribution to journalArticle

17 Scopus citations
Original languageAmerican English
JournalJournal of Applied Physics
DOIs
StatePublished - 8 Dec 2008
Externally publishedYes

Fingerprint Dive into the research topics of 'Thermal stability of nitrogen in nitrided HfSiO2 / SiO2 /Si (001) ultrathin films'. Together they form a unique fingerprint.

  • Cite this