Wet chemical etching studies of Zr and Hf-silicate gate dielectrics

M. A. Quevedo-Lopez, M. El-Bouanani, R. M. Wallace, B. E. Gnade

Research output: Contribution to journal › Article › peer-review

Original language	American English
Pages (from-to)	1891-1897
Number of pages	7
Journal	Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
DOIs	https://doi.org/10.1116/1.1507343
State	Published - 1 Nov 2002
Externally published	Yes

Access to Document

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title = "Wet chemical etching studies of Zr and Hf-silicate gate dielectrics",

author = "Quevedo-Lopez, {M. A.} and M. El-Bouanani and Wallace, {R. M.} and Gnade, {B. E.}",

year = "2002",

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doi = "10.1116/1.1507343",

language = "American English",

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journal = "Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films",

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TY - JOUR

T1 - Wet chemical etching studies of Zr and Hf-silicate gate dielectrics

AU - Quevedo-Lopez, M. A.

AU - El-Bouanani, M.

AU - Wallace, R. M.

AU - Gnade, B. E.

PY - 2002/11/1

Y1 - 2002/11/1

U2 - 10.1116/1.1507343

DO - 10.1116/1.1507343

M3 - Article

SP - 1891

EP - 1897

JO - Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films

JF - Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films

SN - 0734-2101

ER -