A three-layer and two-stage platform for positioning with nanometer resolution and submicrometer accuracy

Marta Torralba, José A. Yagüe-Fabra, José A. Albajez, Margarita Valenzuela, Raquel Acero, Juan J. Aguilar

Resultado de la investigación: Contribución a una conferenciaArtículoInvestigación

Idioma originalInglés estadounidense
Páginas132-135
Número de páginas4
EstadoPublicada - 1 ene 2014
Publicado de forma externa
Evento11th IMEKO TC14 Symposium on Laser Metrology for Precision Measurement and Inspection in Industry, LMPMI 2014 -
Duración: 1 ene 2014 → …

Conferencia

Conferencia11th IMEKO TC14 Symposium on Laser Metrology for Precision Measurement and Inspection in Industry, LMPMI 2014
Período1/01/14 → …

Huella dactilar

Precision engineering
Surface topography
Nanotechnology
Atomic force microscopy
Finite element method

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Torralba, M., Yagüe-Fabra, J. A., Albajez, J. A., Valenzuela, M., Acero, R., & Aguilar, J. J. (2014). A three-layer and two-stage platform for positioning with nanometer resolution and submicrometer accuracy. 132-135. Papel presentado en 11th IMEKO TC14 Symposium on Laser Metrology for Precision Measurement and Inspection in Industry, LMPMI 2014, .
Torralba, Marta ; Yagüe-Fabra, José A. ; Albajez, José A. ; Valenzuela, Margarita ; Acero, Raquel ; Aguilar, Juan J. / A three-layer and two-stage platform for positioning with nanometer resolution and submicrometer accuracy. Papel presentado en 11th IMEKO TC14 Symposium on Laser Metrology for Precision Measurement and Inspection in Industry, LMPMI 2014, .4 p.
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title = "A three-layer and two-stage platform for positioning with nanometer resolution and submicrometer accuracy",
author = "Marta Torralba and Yag{\"u}e-Fabra, {Jos{\'e} A.} and Albajez, {Jos{\'e} A.} and Margarita Valenzuela and Raquel Acero and Aguilar, {Juan J.}",
year = "2014",
month = "1",
day = "1",
language = "American English",
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note = "11th IMEKO TC14 Symposium on Laser Metrology for Precision Measurement and Inspection in Industry, LMPMI 2014 ; Conference date: 01-01-2014",

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Torralba, M, Yagüe-Fabra, JA, Albajez, JA, Valenzuela, M, Acero, R & Aguilar, JJ 2014, 'A three-layer and two-stage platform for positioning with nanometer resolution and submicrometer accuracy' Papel presentado en, 1/01/14, pp. 132-135.

A three-layer and two-stage platform for positioning with nanometer resolution and submicrometer accuracy. / Torralba, Marta; Yagüe-Fabra, José A.; Albajez, José A.; Valenzuela, Margarita; Acero, Raquel; Aguilar, Juan J.

2014. 132-135 Papel presentado en 11th IMEKO TC14 Symposium on Laser Metrology for Precision Measurement and Inspection in Industry, LMPMI 2014, .

Resultado de la investigación: Contribución a una conferenciaArtículoInvestigación

TY - CONF

T1 - A three-layer and two-stage platform for positioning with nanometer resolution and submicrometer accuracy

AU - Torralba, Marta

AU - Yagüe-Fabra, José A.

AU - Albajez, José A.

AU - Valenzuela, Margarita

AU - Acero, Raquel

AU - Aguilar, Juan J.

PY - 2014/1/1

Y1 - 2014/1/1

M3 - Paper

SP - 132

EP - 135

ER -

Torralba M, Yagüe-Fabra JA, Albajez JA, Valenzuela M, Acero R, Aguilar JJ. A three-layer and two-stage platform for positioning with nanometer resolution and submicrometer accuracy. 2014. Papel presentado en 11th IMEKO TC14 Symposium on Laser Metrology for Precision Measurement and Inspection in Industry, LMPMI 2014, .