Detailed characterization of good-quality SnS thin films obtained by chemical solution deposition at different reaction temperatures

D. Cabrera-German, J. A. García-Valenzuela, M. Cota-Leal, M. Martínez-Gil, R. Aceves, M. Sotelo-Lerma

Resultado de la investigación: Contribución a una revistaArtículo

7 Citas (Scopus)
Idioma originalInglés estadounidense
Páginas (desde-hasta)131-142
Número de páginas12
PublicaciónMaterials Science in Semiconductor Processing
DOI
EstadoPublicada - 1 ene 2019

Huella dactilar

Thin films
Rietveld analysis
thin films
Substrates
Temperature
Ammonium Hydroxide
temperature
Thioacetamide
Ammonium hydroxide
Triethanolamine
habits
Platelets
platelets
Optoelectronic devices
Tin
hydroxides
Surface morphology
sulfides
tin
Ethanol

Citar esto

Cabrera-German, D. ; García-Valenzuela, J. A. ; Cota-Leal, M. ; Martínez-Gil, M. ; Aceves, R. ; Sotelo-Lerma, M. / Detailed characterization of good-quality SnS thin films obtained by chemical solution deposition at different reaction temperatures. En: Materials Science in Semiconductor Processing. 2019 ; pp. 131-142.
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author = "D. Cabrera-German and Garc{\'i}a-Valenzuela, {J. A.} and M. Cota-Leal and M. Mart{\'i}nez-Gil and R. Aceves and M. Sotelo-Lerma",
year = "2019",
month = "1",
day = "1",
doi = "10.1016/j.mssp.2018.09.009",
language = "American English",
pages = "131--142",
journal = "Materials Science in Semiconductor Processing",
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Detailed characterization of good-quality SnS thin films obtained by chemical solution deposition at different reaction temperatures. / Cabrera-German, D.; García-Valenzuela, J. A.; Cota-Leal, M.; Martínez-Gil, M.; Aceves, R.; Sotelo-Lerma, M.

En: Materials Science in Semiconductor Processing, 01.01.2019, p. 131-142.

Resultado de la investigación: Contribución a una revistaArtículo

TY - JOUR

T1 - Detailed characterization of good-quality SnS thin films obtained by chemical solution deposition at different reaction temperatures

AU - Cabrera-German, D.

AU - García-Valenzuela, J. A.

AU - Cota-Leal, M.

AU - Martínez-Gil, M.

AU - Aceves, R.

AU - Sotelo-Lerma, M.

PY - 2019/1/1

Y1 - 2019/1/1

U2 - 10.1016/j.mssp.2018.09.009

DO - 10.1016/j.mssp.2018.09.009

M3 - Article

SP - 131

EP - 142

JO - Materials Science in Semiconductor Processing

JF - Materials Science in Semiconductor Processing

SN - 1369-8001

ER -