Effect of deposition rate on the morphology of CdS films deposited in an ammonia free solution

A. Carrillo-Castillo*, F. S. Aguirre-Tostado, A. Salas-Villasenor, I. Mejia, B. E. Gnade, M. Sotelo-Lerma, M. A. Quevedo-López

*Autor correspondiente de este trabajo

Producción científica: Contribución a una revistaArtículorevisión exhaustiva

5 Citas (Scopus)

Resumen

Cadmium sulphide semiconductor thin films have been deposited by chemical bath technique (70°C) on HfO2 substrates. The effect of pH on deposition rate was studied to determine the optimum condition for deposition. CdS films were deposited at pH ranging from 10 to 11.9 in an ammonia-free CBD process employing sodium citrate dihydrate and potassium hydroxide as complexing agents. The increase of pH reduced the deposition rate due to higher complexation and slow generation of Cd2+, improving the morphology of CdS films. X- ray diffraction studies showed hexagonal crystalline phase of CdS with an optical band gap around 2.4 eV as determined by UV-Vis absorption. Fourier transform infrared spectroscopy showed more presence of impurities on CdS films deposited at low deposition rate-high pH.

Idioma originalInglés
Páginas (desde-hasta)81-86
Número de páginas6
PublicaciónChalcogenide Letters
Volumen10
N.º2
EstadoPublicada - 2013

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